Amorphous carbon nitrogenated films prepared by plasma immersion ion implantation and deposition

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1561-1567

  Rangel, Elidiane C ^a   Durrant, Steven F ^a   Rangel, Rita C C ^a   Kayama, Milton E ^a   Landers, Richard ^b   da Cruz, Nilson C ^a  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

^b UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

Mechanical properties; Plasma immersion ion implantation and deposition; Roughness; Wettability

Indexed keywords

CARBON; DEPOSITION; GLOW DISCHARGES; ION IMPLANTATION; MECHANICAL PROPERTIES; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON FILMS; NANOINDENTATION MEASUREMENTS; PLASMA IMMERSION; WETTABILITY;

AMORPHOUS FILMS;

EID: 33750954174     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.05.016     Document Type: Article

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