Effect of surface functional groups on nanostructure fabrication using AFM lithography

Materials Science and Engineering C

Volumn 24, Issue 1-2, 2004, Pages 311-314

  Park, Jinyoung ^a   Lee, Haiwon ^a  

^a Hanyang University   (South Korea)

Author keywords

AFM lithography; Contact angle; Self assembled monolayer; Surface functionality

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; FABRICATION; GONIOMETERS; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; SELF ASSEMBLY; SILICON WAFERS;

RESIST FILMS;

MATERIALS SCIENCE;

ATOMIC FORCE MICROSCOPY;

EID: 0347477256     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2003.09.061     Document Type: Article

References (8)

1. Lee W. Kim E.R. Lee H. Langmuir 18 2002 8375
2. Ahn S.J. Jang Y.K. Kim S.A. Lee H. Lee S.H. Ultramicroscopy 91 2002 171
3. Stievenard D. Fontaine P.A. Dubois E. Appl. Phys. Lett. 70 1997 3272
4. Arouris P. Hertel T. Marel R. Appl. Phys. Lett. 71 1997 285
5. Sugimura H. Nakagiri N. J. Vac. Sci. Technol., A 141 1996 223
6. Heiney P.A. Gruneberg K. Fang J. Langmuir 16 2000 2651
7. Ingall M.D.K. Honeyman C.H. Mercure J.V. Bianconi P.A. Kunz R.R. J. Am. Chem. Soc. 121 1999 3607
8. Wang Y. Lieberman M. Langmuir 19 2003 1159