Surface functional group effect on atomic force microscope anodization lithography

Langmuir

Volumn 21, Issue 19, 2005, Pages 8839-8843

  Lee, Wonbae ^a   Lee, Haiwon ^a,b   Chun, Myung Suk ^c  

^a Hanyang University   (South Korea)

^b National Program for Tera Level Devices   (South Korea)

^c Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROCHEMISTRY; MONOLAYERS; SELF ASSEMBLY;

ANODIZATION LITHOGRAPHY; SAM RESIST FILMS;

ANODIC OXIDATION;

EID: 25844517942     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0508083     Document Type: Article

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