Highly versatile and robust materials for soft imprint lithography based on thiol-ene click chemistry

Advanced Materials

Volumn 20, Issue 19, 2008, Pages 3728-3733

  Campos, Luis M ^a   Meinel, Ines ^b   Guino, Rosette G ^a   Schierhorn, Martin ^a   Gupta, Nalini ^a   Stucky, Galen D ^a   Hawker, Craig J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b MC Research and Innovation Center   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CHEMICAL BONDS; CHEMISTRY; COLLOIDS; CROSSLINKING; HYDROCARBONS; MECHANICAL PROPERTIES; NANOIMPRINT LITHOGRAPHY; OLEFINS; OXYGEN; PHOTORESISTS; POLYETHYLENE GLYCOLS; SILICONES;

CLICK CHEMISTRIES; DOUBLE BONDS; EFFICIENT; HIGH ASPECT RATIOS; HIGH FIDELITIES; HYDROGEL SYSTEMS; MODULAR; ORTHOGONAL REACTIONS; PHYSICAL AND MECHANICAL PROPERTIES; POLYSILOXANE; ROBUST MATERIALS; SOFT IMPRINT LITHOGRAPHIES; SPECIALIZED EQUIPMENTS; STARTING MATERIALS; THIOLENE; USER FRIENDLINESSES; UV LIGHT;

MATERIALS PROPERTIES;

EID: 54949090372     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200800330     Document Type: Article

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