On the growth mechanism of plasma deposited amorphous silicon thin films

Applied Physics Letters

Volumn 93, Issue 15, 2008, Pages

  Pandey, Sumeet C ^a   Singh, Tejinder ^a   Maroudas, Dimitrios ^a  

^a University of Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; COORDINATION REACTIONS; DENSITY FUNCTIONAL THEORY; DISSOCIATION; MONTE CARLO METHODS; MOSFET DEVICES; PLASMA DEPOSITION; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SILICON; SURFACE DIFFUSION; SURFACE REACTIONS; THICK FILMS; THIN FILMS;

AMORPHOUS SILICON THIN FILMS; COORDINATION DEFECTS; DENSITY FUNCTIONAL THEORY CALCULATIONS; DEPOSITED FILMS; DISSOCIATION REACTIONS; DISSOCIATIVE ADSORPTIONS; GROWTH MECHANISMS; KINETIC; KINETIC MONTE CARLO SIMULATIONS; RADICAL INTERACTIONS; REACTION PATHWAYS; SILYL RADICALS; SURFACE COMPOSITIONS; SURFACE HYDRIDES;

FILM GROWTH;

EID: 54149085601     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2990641     Document Type: Article

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