-
1
-
-
0035417691
-
-
G. Dinescu, A. de Graaf, E. Aldea, M. C. M. van de Sanden. Plasma Sources Sci. Technol. 10, 513 (2001).
-
(2001)
Plasma Sources Sci. Technol
, vol.10
, pp. 513
-
-
Dinescu, G.1
de Graaf, A.2
Aldea, E.3
van de Sanden, M.C.M.4
-
3
-
-
53949107431
-
-
U.S. Patent 4871 918, Filed 06 October 1987, Issued 3 October 1989
-
V. I. Miljevic, U.S. Patent 4871 918, Filed 06 October 1987, Issued 3 October 1989.
-
-
-
Miljevic, V.I.1
-
7
-
-
53949123259
-
-
U.S. Patent 6137 231, Filed 10 September 1996, Issued 24 October 2000
-
A. Anders, S. Anders, M. Dickinson, M. Rubin, N. Newman. U.S. Patent 6137 231, Filed 10 September 1996, Issued 24 October 2000.
-
-
-
Anders, A.1
Anders, S.2
Dickinson, M.3
Rubin, M.4
Newman, N.5
-
8
-
-
53949101983
-
-
U.S. Patent 6140 773, Filed 19 January 1999, Issued 31 October 2000
-
A. Anders, P. Maschwitz. U.S. Patent 6140 773, Filed 19 January 1999, Issued 31 October 2000.
-
-
-
Anders, A.1
Maschwitz, P.2
-
9
-
-
53949084611
-
-
U.S. Patent 6388 381, Filed 19 February 1996, Issued 14 May 2002
-
A. Anders. U.S. Patent 6388 381, Filed 19 February 1996, Issued 14 May 2002.
-
-
-
Anders, A.1
-
10
-
-
0035327011
-
-
A. E. Zhukov, R. Zhao, P. Specht, V. M. Ustinov, A. Anders, E. R. Weber. Semicond. Sci. Technol. 16, 413(2001).
-
(2001)
Semicond. Sci. Technol
, vol.16
, pp. 413
-
-
Zhukov, A.E.1
Zhao, R.2
Specht, P.3
Ustinov, V.M.4
Anders, A.5
Weber, E.R.6
-
11
-
-
34247583003
-
-
A. Anders, G. Yu. Yushkov. Rev. Sci. Instrum. 78, 043304 (2007).
-
A. Anders, G. Yu. Yushkov. Rev. Sci. Instrum. 78, 043304 (2007).
-
-
-
-
14
-
-
33748426344
-
-
M. Laroussi, C. Tendero, X. Lu, S. Alia, W. L. Hynes. Plasma Process. Polym. 3, 470 (2006).
-
M. Laroussi, C. Tendero, X. Lu, S. Alia, W. L. Hynes. Plasma Process. Polym. 3, 470 (2006).
-
-
-
-
15
-
-
33747821445
-
-
M. Laroussi, O. Minayeva, F. C. Dobbs, J. Woods. IEEE Trans. Plasma Sci. 34, 1253 (2006).
-
(2006)
IEEE Trans. Plasma Sci
, vol.34
, pp. 1253
-
-
Laroussi, M.1
Minayeva, O.2
Dobbs, F.C.3
Woods, J.4
-
19
-
-
0038936795
-
-
A. Brablec, V. Kapicka, Z. Ondrácek, P. Slavícek, M. Strecha, F. Stastný, R. Vaculík, M. Sícha. Czech. J. Phys. 49, 329 (1999).
-
(1999)
Czech. J. Phys
, vol.49
, pp. 329
-
-
Brablec, A.1
Kapicka, V.2
Ondrácek, Z.3
Slavícek, P.4
Strecha, M.5
Stastný, F.6
Vaculík, R.7
Sícha, M.8
-
20
-
-
0036001690
-
-
J. Tous, M. Sícha, Z. Hubicka, L. Soukup, L. Jastrabík, M. Cada, M. Tichý. Contrib. Plasma Phys. 42, 119(2002).
-
(2002)
Contrib. Plasma Phys
, vol.42
, pp. 119
-
-
Tous, J.1
Sícha, M.2
Hubicka, Z.3
Soukup, L.4
Jastrabík, L.5
Cada, M.6
Tichý, M.7
-
21
-
-
0035387515
-
-
D. Korzec, D. Nithammer, J. Engemann, T. Ikeda, T. Aoki, Y. Hatanaka. Surf. Coat. Technol. 142-144, 21 (2001).
-
(2001)
Surf. Coat. Technol
, vol.142-144
, pp. 21
-
-
Korzec, D.1
Nithammer, D.2
Engemann, J.3
Ikeda, T.4
Aoki, T.5
Hatanaka, Y.6
-
22
-
-
33947184244
-
-
R. Foest, E. Kindel, H. Lange, A. Ohl, M. Stieber, K.-D. Weltmann. Contrib. Plasma Phys. 47, 119(2006).
-
(2006)
Contrib. Plasma Phys
, vol.47
, pp. 119
-
-
Foest, R.1
Kindel, E.2
Lange, H.3
Ohl, A.4
Stieber, M.5
Weltmann, K.-D.6
-
23
-
-
34249911204
-
-
A. Yanguas-Gil, K. Focke, J. Benedikt, A. von Keudell. J. Appl. Phy. 101, 103307 (2007).
-
(2007)
J. Appl. Phy
, vol.101
, pp. 103307
-
-
Yanguas-Gil, A.1
Focke, K.2
Benedikt, J.3
von Keudell, A.4
-
25
-
-
34547504254
-
-
L. Bárdos, H. Baránková. Plasma Process. Polym. 4, 511 2007.
-
L. Bárdos, H. Baránková. Plasma Process. Polym. 4, 511 2007.
-
-
-
-
26
-
-
0035803901
-
-
M. Sícha, Z. Hubicka, L. Soukup, L. Jastrabík, M. Cada, P. Spatenka. Surf. Coat. Technol. 148, 199 (2001).
-
(2001)
Surf. Coat. Technol
, vol.148
, pp. 199
-
-
Sícha, M.1
Hubicka, Z.2
Soukup, L.3
Jastrabík, L.4
Cada, M.5
Spatenka, P.6
-
28
-
-
21544484261
-
-
H. Koinuma, H. Ohkubo, T. Hashimoto, K. Inomata, T. Shiraishi, A. Miyanaga, S. Hayashi. Appl. Phys. Lett. 60, 816 (1992).
-
(1992)
Appl. Phys. Lett
, vol.60
, pp. 816
-
-
Koinuma, H.1
Ohkubo, H.2
Hashimoto, T.3
Inomata, K.4
Shiraishi, T.5
Miyanaga, A.6
Hayashi, S.7
-
29
-
-
0036860831
-
-
E. Stoffels, A. J. Flikweert, W. W. Stoffels, G. M. W. Kroesen. Plasma Sources Sci. Technol. 4, 383 (2002).
-
(2002)
Plasma Sources Sci. Technol
, vol.4
, pp. 383
-
-
Stoffels, E.1
Flikweert, A.J.2
Stoffels, W.W.3
Kroesen, G.M.W.4
-
31
-
-
33747850804
-
-
J. Goree, B. Liu, D. Drake, E. Stoffels. IEEE Trans. Plasma Sci. 34, 1317 (2006).
-
(2006)
IEEE Trans. Plasma Sci
, vol.34
, pp. 1317
-
-
Goree, J.1
Liu, B.2
Drake, D.3
Stoffels, E.4
-
32
-
-
0032306958
-
-
A. Schultze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn, R. F. Hicks. IEEE Trans. Plasma Sci. 26, 1685 (1998).
-
(1998)
IEEE Trans. Plasma Sci
, vol.26
, pp. 1685
-
-
Schultze, A.1
Jeong, J.Y.2
Babayan, S.E.3
Park, J.4
Selwyn, G.S.5
Hicks, R.F.6
-
33
-
-
0000904120
-
-
J. Park, I. Henins, H. W. Herrmann, G. S. Selwyn, J. Y. Jeong, R. F. Hicks, D. Shim, C. S. Chang. Appl. Phys. Lett. 76, 288 (2000).
-
(2000)
Appl. Phys. Lett
, vol.76
, pp. 288
-
-
Park, J.1
Henins, I.2
Herrmann, H.W.3
Selwyn, G.S.4
Jeong, J.Y.5
Hicks, R.F.6
Shim, D.7
Chang, C.S.8
-
35
-
-
0032138693
-
-
J. Y. Jeong, S. E. Babayan, V. J. Tu, J. Park, I. Henins, R. F. Hicks, G. S. Selwyn. Plasma Sources Sci. Technol. 7, 282 (1998).
-
(1998)
Plasma Sources Sci. Technol
, vol.7
, pp. 282
-
-
Jeong, J.Y.1
Babayan, S.E.2
Tu, V.J.3
Park, J.4
Henins, I.5
Hicks, R.F.6
Selwyn, G.S.7
-
36
-
-
0036469404
-
-
Y. Kabouzi, M. D. Calzada, M. Moisan, K. C. Tran, C. Trassy. J. Appl. Phys. 91, 1008 (2000).
-
(2000)
J. Appl. Phys
, vol.91
, pp. 1008
-
-
Kabouzi, Y.1
Calzada, M.D.2
Moisan, M.3
Tran, K.C.4
Trassy, C.5
-
37
-
-
0033903504
-
-
G. Dinescu, B. Mitu, E. Aldea, M. Dinescu. Vacuum 56, 83 (2000).
-
(2000)
Vacuum
, vol.56
, pp. 83
-
-
Dinescu, G.1
Mitu, B.2
Aldea, E.3
Dinescu, M.4
-
38
-
-
0038048194
-
-
O. M. Yardimci, A. V. Saveliev, A. A. Fridman, L. A. Kennedy. J. Appl. Phys. 87, 1632 (1999).
-
(1999)
J. Appl. Phys
, vol.87
, pp. 1632
-
-
Yardimci, O.M.1
Saveliev, A.V.2
Fridman, A.A.3
Kennedy, L.A.4
-
40
-
-
38549091721
-
-
S. Vizireanu, B. Mitu, G. Dinescu, L. Nistor, C. Ghica, A. Maraloiu, M. Stancu, G. Ruxandra. J. Optoelect. Adv. Mater. 9, 1649 (2007).
-
(2007)
J. Optoelect. Adv. Mater
, vol.9
, pp. 1649
-
-
Vizireanu, S.1
Mitu, B.2
Dinescu, G.3
Nistor, L.4
Ghica, C.5
Maraloiu, A.6
Stancu, M.7
Ruxandra, G.8
-
41
-
-
34248381289
-
-
G. Dinescu, C. Ruset, M. Dinescu. Plasma Process. Polym. 4, 282 (2007).
-
G. Dinescu, C. Ruset, M. Dinescu. Plasma Process. Polym. 4, 282 (2007).
-
-
-
-
42
-
-
36549055145
-
-
A. Malesevic, S. Vizireanu, R. Kemps, A. Vanhulsel. C. van Haesendonck, G. Dinescu. Carbon 45, 2932 (2007).
-
(2007)
Carbon
, vol.45
, pp. 2932
-
-
Malesevic, A.1
Vizireanu, S.2
Kemps, R.3
Vanhulsel, A.4
van Haesendonck, C.5
Dinescu, G.6
-
43
-
-
35148854678
-
-
G. Dinescu, E. R. Ionita, I. Luciu, C. Grisolia. Fusion Eng. Des. 82, 2311 (2007).
-
(2007)
Fusion Eng. Des
, vol.82
, pp. 2311
-
-
Dinescu, G.1
Ionita, E.R.2
Luciu, I.3
Grisolia, C.4
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