RF capillary jet - A tool for localized surface treatment

Contributions to Plasma Physics

Volumn 47, Issue 1-2, 2007, Pages 119-128

  Foest, R ^a   Kindel, E ^a   Lange, H ^a   Ohl, A ^a   Stieber, M ^a   Weltmann, K D ^a  

^a Institute for Low Temperature Plasma Physics   (Germany)

Author keywords

Atmospheric pressure plasma; Plasma cleaning and plasma activation; Plasma enhanced CVD; Protective coatings; UV emission

Indexed keywords

ARGON; ATMOSPHERIC PRESSURE; FLOW OF GASES; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA JETS; SUBSTRATES; SURFACE TREATMENT;

ATMOSPHERIC PRESSURE PLASMAS; CAPILLARY PLASMA; LOCALISED; NONTHERMAL; PLASMA ACTIVATION; PLASMA CLEANING; PLASMA CLEANING AND PLASMA ACTIVATION; PLASMA-ENHANCED CVD; UV EMISSIONS; VUV SPECTRUM;

PROTECTIVE COATINGS;

EID: 33947184244     PISSN: 08631042     EISSN: 15213986     Source Type: Journal    
DOI: 10.1002/ctpp.200710017     Document Type: Conference Paper

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