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Volumn 142-144, Issue , 2001, Pages 21-27

Radio frequency hollow cathode jet: Optical emission study

Author keywords

Emission spectroscopy; Hydrogen plasma; Radial source; Remote plasma; Rf discharg

Indexed keywords

CATHODES; FREE RADICALS; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPECTROSCOPIC ANALYSIS;

EID: 0035387515     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01241-5     Document Type: Article
Times cited : (7)

References (22)
  • 16
    • 0028460757 scopus 로고
    • Tungsten chemical vapor deposition on silicon and silicon dioxide with plasma excited hydrogen Jpn
    • (1994) J. Appl. Phys , vol.33 , pp. 4413-4416
    • Saito, Y.1    Takagi, T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.