Thermal annealing effect on optical properties of electrodeposited ZnO thin films

Journal of Physics D: Applied Physics

Volumn 41, Issue 19, 2008, Pages

  Laurent, K ^a   Yu, D P ^b   Tusseau Nenez, S ^c   Leprince Wang, Y ^a  

^a National Centre of Scientific Research   (France)

^b PEKING UNIVERSITY   (China)

^c CNRS Université Paris Est Créteil Val de Marne   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARCHITECTURAL ACOUSTICS; ATMOSPHERIC TEMPERATURE; CORROSION; ELECTRON ENERGY LOSS SPECTROSCOPY; EMISSION SPECTROSCOPY; HYDROGEN; LEAKAGE (FLUID); METALLIC FILMS; MICROSCOPIC EXAMINATION; OPTICAL FILMS; OPTICAL PROPERTIES; OXYGEN; OXYGEN VACANCIES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SILICON; SILICON WAFERS; SOLUTIONS; SPECTRUM ANALYSIS; SURFACE MORPHOLOGY; SURFACE TREATMENT; THERMAL SPRAYING; THICK FILMS; THIN FILMS; ZINC ALLOYS; ZINC OXIDE;

AFTER-TREATMENT; ANNEALING TEMPERATURE; ANNEALING TREATMENTS; AQUEOUS SOLUTIONS; AS-GROWN; ATOMIC FORCE; CRYSTAL QUALITIES; EMISSION BANDS; ENERGY DISPERSIVE X-RAY SPECTROSCOPY; INTERSTITIAL OXYGEN; OPTICAL-; P-TYPE SI; PARAMETER VALUES; ROUGHNESS MEAN SQUARE; SMOOTH SURFACES; THERMAL ANNEALING; THERMAL TREATMENTS; UV EMISSIONS; VISIBLE REGIONS; ZNO THIN FILMS;

ANNEALING;

EID: 53349099426     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/19/195410     Document Type: Article

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