Direct measurement of the effect of substrate photoelectrons in x-ray nanolithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2509-2513

  Carter, D J D ^a   Pepin, A ^a,c   Schweizer, M R ^a   Smith, H I ^a   Ocola, L E ^b  

^a USA   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

^c CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001346385     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589675     Document Type: Article

References (25)

1. L. E. Ocola and F. Cerrina, J. Vac. Sci. Technol. B 11, 2839 (1993).
2. K. Early, M. L. Schattenburg, and H. I. Smith, Microelectron. Eng. 11, 317 (1990).
3. J. R. Maldonado, G. A. Coquin, D. Maydan, and S. Somekh, J. Vac. Sci. Technol. 12, 1329 (1975).
4. E. Hundt and P. Tischer, J. Vac. Sci. Technol. 15, 1009 (1978).
5. H. Betz, F. K. Fey, A. Heuberger, and P. Tischer, IEEE Trans. Electron Devices ED-26, 693 (1979).
6. H. Betz, K. Heinrich, A. Heuberger, H. Huber, and H. Oertel, J. Vac. Sci. Technol. B 4, 248 (1986).
7. K. Murata, J. Appl. Phys. 57, 575 (1985).
8. K. Murata, M. Kotera, K. Nagami, and S. Namba, IEEE Trans. Electron Devices ED-32, 1694 (1985).
9. K. Murata, M. Tanaka, and H. Kawata, Optik (Stuttgart) 84, 163 (1990).
10. Y. Saitoh, H. Yoshihara, I. Watanabe, and S. Nakayama, J. Vac. Sci. Technol. B 2, 63 (1984).
11. L. Semenzato, S. Eaton, A. Neukermans, and R. P. Jaeger, J. Vac. Sci. Technol. B 3, 245 (1985).
12. K. Deguchi, H. Namatsu, K. Komatsu, and A. Yoshikawa, J. Vac. Sci. Technol. B 5, 551 (1987).
13. T. Ogawa, K. Mochiji, Y. Soda, and T. Kimura, Proceedings of the 1989 International Symposium on MicroProcess Conference, 1989 (unpublished), pp. 120-123.
14. V. White, L. Ocola, F. Cerrina, Y. Vladimirsky, and J. Maldonado, J. Vac. Sci. Technol. B 9, 3270 (1991).
15. L. E. Ocola and F. Cerrina, J. Vac. Sci. Technol. B 12, 3986 (1994).
16. S. D. Hector, Ph.D. thesis, Massachusetts Institute of Technology, May 1994.
17. R. K. Kupka, Y. Chen, R. Planel, and H. Launois, Microelectron. Eng. 27, 311 (1995).
18. G. Feiertag, W. Ehrfeld, H. Lehr, A. Schmidt, and M. Schmidt, Microelectron. Eng. 35, 557 (1997).
19. F. J. Pantenburg, J. Chlebek, A. El-Kholi, H.-L. Huber, J. Mohr, H. K. Oertel, and J. Schulz, Microelectron. Eng. 23, 223 (1994).
20. R. J. Hawryluk, H. I. Smith, A. Soares, and A. M. Hawryluk, J. Appl. Phys. 46, 2528 (1975).
21. S. E. Bernacki and H. I. Smith, Sixth International Conference on Electron and Ion Beam Science and Technology, 1974 (unpublished), pp. 34-46.
22. B. L. Henke and M. A. Tester, in Advances in X-ray Analysis (Plenum, New York, 1975), Vol. 18.
23. E. P. Bertin, Principles and Practice of X-Ray Spectrometric Analysis, 2nd ed. (Plenum, New York, 1975), Chap. 1.
24. B. L. Henke, E. M. Gullikson, and J. C. Davis, At. Data Nucl. Data Tables 54, 181 (1993). Updated database was accessed by private communication through the group's web site at http://www-cxro.lbl.gov/ optical_constants/.
25. T. E. Everhart and P. H. Hoff, J. Appl. Phys. 42, 5837 (1971).