Pentacene patterning on aluminum nitride by water dipping

Journal of the Electrochemical Society

Volumn 155, Issue 11, 2008, Pages

  Zan, Hsiao Wen ^a   Chou, Cheng Wei ^a   Wang, Chung Hwa ^b   Yen, Kuo Hsi ^a   Hwang, Jenn Chang ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM; ALUMINUM COMPOUNDS; INTERFACIAL ENERGY; LIGHT METALS; LITHOGRAPHY; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; NITRIDES; NONMETALS; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PLASMA APPLICATIONS; PLASMA DEPOSITION; PLASMAS; SEMICONDUCTING ORGANIC COMPOUNDS; SURFACE CHEMISTRY; SURFACE TENSION; WATER TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM NITRIDE; CONVENTIONAL LITHOGRAPHY; CONVENTIONAL PHOTOLITHOGRAPHY; MODIFY SURFACE; O2-PLASMA TREATMENT; PATTERNING METHODS; PENTACENE; PENTACENE FILMS; POLAR SURFACES; WATER INTRUSIONS; X-RAY PHOTOELECTRON SPECTROSCOPY XPS; XPS MEASUREMENTS;

SURFACE TREATMENT;

EID: 52649090711     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2976894     Document Type: Article

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