Optimization of pretreatment for liquid-phase deposition of SiO2 on ARTON plastic substrate

Journal of Electronic Materials

Volumn 32, Issue 6, 2003, Pages 478-482

  Huang, C J ^a   Shih, W C ^a  

^a SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Liquid phase deposition; Plastic substrate; SiO2

Indexed keywords

DEPOSITION; INORGANIC ACIDS; PLASTICS APPLICATIONS; POLYTETRAFLUOROETHYLENES; REFRACTIVE INDEX; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR GROWTH; SUBSTRATES; THERMODYNAMIC STABILITY; THIN FILMS;

HEXAFLUOROSILICIC-ACID; LIQUID-PHASE DEPOSITION; PLASTIC SUBSTRATE; SILICON DIOXIDE FILM;

SILICA;

EID: 0037822633     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-003-0129-8     Document Type: Article

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