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Volumn 9, Issue 8, 2006, Pages

Highly conductive HfNxfilms prepared by plasma-assisted atomic layer deposition

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM GROWTH; FILMS; HYDROGEN; LAYERED MANUFACTURING; PLASMA APPLICATIONS;

DEPOSITION TEMPERATURE; HYDROGEN PLASMAS; PLASMA-ASSISTED ATOMIC LAYER DEPOSITION; TETRAKIS(DIMETHYLAMIDO)HAFNIUM;

HAFNIUM COMPOUNDS;

EID: 33745427202 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.2206884 Document Type: Article

Times cited : (28)

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