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Volumn 39, Issue 4, 2008, Pages 435-438
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Aperture based Raman spectroscopy on SiGe film structures with high spatial resolution
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Author keywords
Aperture; Raman spectroscopy; Silicon germanium; Strain
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
DIFFRACTION;
GERMANIUM;
LASER BEAMS;
SI-GE ALLOYS;
SILICON;
APERTURE;
DIFFRACTION LIMITS;
ETCHED TUNGSTEN TIP;
FILM STRUCTURE;
HIGH SPATIAL RESOLUTION;
LINES STRUCTURES;
METALLIC APERTURES;
SILICON GERMANIUM FILMS;
SILICON GERMANIUMS (SIGE);
STRAIN RESOLUTION;
RAMAN SPECTROSCOPY;
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EID: 51549109906
PISSN: 03770486
EISSN: 10974555
Source Type: Journal
DOI: 10.1002/jrs.1852 Document Type: Article |
Times cited : (4)
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References (20)
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