Nano-Raman spectroscopy with metallized atomic force microscopy tips on strained silicon structures

Journal of Applied Physics

Volumn 101, Issue 10, 2007, Pages

  Zhu, Liang ^a,b   Georgi, Carsten ^a,c   Hecker, Michael ^a   Rinderknecht, Jochen ^a   Mai, Andreas ^a,d   Ritz, Yvonne ^a   Zschech, Ehrenfried ^a  

^a IBM MICROELECTRONICS   (United States)

^b ETH ZURICH   (Switzerland)

^c UNIVERSITY OF MUNICH   (Germany)

^d IHP   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FIELD EFFECT TRANSISTORS; QUARTZ; RAMAN SCATTERING; SILICON; SPUTTER DEPOSITION;

NANO-RAMAN SPECTROSCOPY; SILICON STRUCTURES; STRAINED SILICON FILMS;

THIN FILMS;

EID: 34249886295     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2732435     Document Type: Article

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