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Volumn , Issue , 2008, Pages 2096-2100

Electrodeposition of indium for bump bonding

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC COMPONENTS; HIGH-DENSITY INTERCONNECTIONS; HYBRID PIXEL DETECTORS; PACKAGING DENSITIES;

EID: 51349158904     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ECTC.2008.4550274     Document Type: Conference Paper
Times cited : (22)

References (16)
  • 1
    • 34248210708 scopus 로고    scopus 로고
    • Special bump bonding technique for silicon pixel detectors
    • E. Cabraja, M. Bigas et al. Special bump bonding technique for silicon pixel detectors, Nucl. Instr. and Meth. A 576 (2007) 150-153.
    • (2007) Nucl. Instr. and Meth. A , vol.576 , pp. 150-153
    • Cabraja, E.1    Bigas, M.2
  • 2
    • 34047207214 scopus 로고    scopus 로고
    • Bonding techniques for hybrid active pixel sensors (HAPS)
    • M. Bigas, E. Cabraja, M. Lozano. Bonding techniques for hybrid active pixel sensors (HAPS), Nucl. Instr. and Meth. A 574 (2007) 392-400.
    • (2007) Nucl. Instr. and Meth. A , vol.574 , pp. 392-400
    • Bigas, M.1    Cabraja, E.2    Lozano, M.3
  • 3
    • 0037059417 scopus 로고    scopus 로고
    • Characterization of indium and solder bump bonding for pixel detectors
    • S. Cihangir, S. Kwan. Characterization of indium and solder bump bonding for pixel detectors, Nucl. Instr. and Meth. A 476 (2002) 670-675.
    • (2002) Nucl. Instr. and Meth. A , vol.476 , pp. 670-675
    • Cihangir, S.1    Kwan, S.2
  • 4
    • 0035845693 scopus 로고    scopus 로고
    • Development of a bump bonding interconnect technology for GaAs pixel detectors
    • J. Breibach, K Lübelsmeyer, et al. Development of a bump bonding interconnect technology for GaAs pixel detectors, Nucl. Instr. and Meth. A 470 (2001) 576-582.
    • (2001) Nucl. Instr. and Meth. A , vol.470 , pp. 576-582
    • Breibach, J.1    Lübelsmeyer, K.2
  • 5
    • 0035367256 scopus 로고    scopus 로고
    • Study of indium bumps for ATLAS pixel detector
    • C. Gemme, A.M. Fiorello, et al. Study of indium bumps for ATLAS pixel detector, Nucl. Instr. and Meth. A 465 (2001) 200-203.
    • (2001) Nucl. Instr. and Meth. A , vol.465 , pp. 200-203
    • Gemme, C.1    Fiorello, A.M.2
  • 6
    • 33747183911 scopus 로고    scopus 로고
    • Development of an indium bump bond process for silicon pixel detectors at PSI
    • Ch. Broennimann, F. Glaus, et al. Development of an indium bump bond process for silicon pixel detectors at PSI, Nucl. Instr. and Meth. A 565 (2006) 303-308.
    • (2006) Nucl. Instr. and Meth. A , vol.565 , pp. 303-308
    • Broennimann, C.1    Glaus, F.2
  • 7
    • 0035450661 scopus 로고    scopus 로고
    • Plating technology for electronics packaging
    • H. Honma, Plating technology for electronics packaging, Electrochimica Acta, 47 (2001) 75-84.
    • (2001) Electrochimica Acta , vol.47 , pp. 75-84
    • Honma, H.1
  • 9
    • 0037604511 scopus 로고    scopus 로고
    • Technology for very dense hybrid detector arrays using electroplated indium solderbumps
    • Feb
    • P. Merken, J. John, et al. Technology for very dense hybrid detector arrays using electroplated indium solderbumps, IEEE Transactions on Advanced Packaging, Vol. 26, No. 1, Feb. 2003.
    • (2003) IEEE Transactions on Advanced Packaging , vol.26 , Issue.1
    • Merken, P.1    John, J.2
  • 10
    • 0345868294 scopus 로고    scopus 로고
    • Fabrication of indium bumps for hybrid infrared focal plane array applications
    • J. Jiang, S. Tsao, et al. Fabrication of indium bumps for hybrid infrared focal plane array applications, Infrared Physics & Technology, 45 (2004) 143-151.
    • (2004) Infrared Physics & Technology , vol.45 , pp. 143-151
    • Jiang, J.1    Tsao, S.2
  • 11
    • 0041467481 scopus 로고    scopus 로고
    • Electrochemical processing techonlogies in chip fabrication: Challenges and opportunities
    • M. Datta, Electrochemical processing techonlogies in chip fabrication: challenges and opportunities, Electrochimica Acta, 48 (2003) 2975-2985.
    • (2003) Electrochimica Acta , vol.48 , pp. 2975-2985
    • Datta, M.1
  • 12
    • 0030703837 scopus 로고    scopus 로고
    • A path: From electroplating through lithographic masks in electronics to LIGA in MEMS
    • L.T. Romankiw. A path: from electroplating through lithographic masks in electronics to LIGA in MEMS, Electrochimica Acta, Vol. 42, pp. 2985-3005, 1997.
    • (1997) Electrochimica Acta , vol.42 , pp. 2985-3005
    • Romankiw, L.T.1
  • 13
    • 0042529428 scopus 로고    scopus 로고
    • Fundamental aspects and applications of electrochemical microfabrication
    • M. Datta, D. Landolt. Fundamental aspects and applications of electrochemical microfabrication, Electrochimica Acta, 45 (2000) 2535-2558.
    • (2000) Electrochimica Acta , vol.45 , pp. 2535-2558
    • Datta, M.1    Landolt, D.2
  • 14
    • 51349151160 scopus 로고    scopus 로고
    • Indium Sulfamate Plating Bath, Indium Corporation, Released in 2007.
    • Indium Sulfamate Plating Bath, Indium Corporation, Released in 2007.
  • 16
    • 0022945430 scopus 로고
    • Jean-Claude Puippe, Frank Leaman, American Electroplaters and Surface Finishers Soc
    • J.Cl.Puippe in: Jean-Claude Puippe, Frank Leaman, Theory and practice of pulse plating, American Electroplaters and Surface Finishers Soc., 1986 pp. 1-11.
    • (1986) Theory and practice of pulse plating , pp. 1-11
    • Puippe, J.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.