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Volumn 6151 II, Issue , 2006, Pages

EUV generation from lithium laser plasma for lithography

Author keywords

EUV lithography; EUV sources; EUV spectroscopy; Laser plasmas; Lithium; Tin

Indexed keywords

EUV LITHOGRAPHY; EUV SOURCES; EUV SPECTROSCOPY; LASER PLASMAS;

EID: 33745628311     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.660584     Document Type: Conference Paper
Times cited : (9)

References (20)
  • 3
    • 84858913530 scopus 로고    scopus 로고
    • Feb. 22, proceedings
    • Y. Watanabe, presentation at ISMT EUV source workshop, Feb. 22, 2004, proceedings available at www.sematech.org.
    • (2004) ISMT EUV Source Workshop
    • Watanabe, Y.1
  • 6
    • 33745626957 scopus 로고    scopus 로고
    • Klosner, M. A., Silfvast, W.T. Vol. 23, No. 20, 1998
    • Klosner, M. A., Silfvast, W.T. Vol. 23, No. 20, 1998.
  • 8
    • 33745601281 scopus 로고
    • MS thesis (UCF, Orlando, FL)
    • D. J. O'Connell, MS thesis (UCF, Orlando, FL, 1994).
    • (1994)
    • O'Connell, D.J.1
  • 11
    • 33745609131 scopus 로고    scopus 로고
    • Griem, H. R. McGraw-Hill, New York, 1964
    • Griem, H. R. McGraw-Hill, New York, 1964.
  • 12
    • 33745605658 scopus 로고    scopus 로고
    • Griem H.R. New York, Academic Press, 1974
    • Griem H.R. New York, Academic Press, 1974.
  • 14
    • 33745634273 scopus 로고    scopus 로고
    • M. Al-Rabban et. al. (San Jose, CA, USA, 2005), Vol. 5751,2005
    • M. Al-Rabban et. al. (San Jose, CA, USA, 2005), Vol. 5751,2005.
  • 19
    • 33745603347 scopus 로고    scopus 로고
    • FC2: Calibration of a EUV Source at PLEX LLC (International SEMATECH Technology Transfer #04024490A-TR)
    • FC2: Calibration of a EUV Source at PLEX LLC (International SEMATECH Technology Transfer #04024490A-TR)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.