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Volumn 90, Issue 15, 2007, Pages

Extreme ultraviolet source using a forced recombination process in lithium plasma generated by a pulsed laser

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; LASER BEAM EFFECTS; LASER PULSES; LIGHT EMISSION; LITHIUM COMPOUNDS; PLASMAS;

EID: 34247195637     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2719672     Document Type: Article
Times cited : (22)

References (13)
  • 1
    • 34247265033 scopus 로고    scopus 로고
    • EUV Sources for Lithography, edited by V. Bakshi (SPIE, Washington, 2005), 1-1044.
    • EUV Sources for Lithography, edited by V. Bakshi (SPIE, Washington, 2005), 1-1044.
  • 13
    • 0010766661 scopus 로고    scopus 로고
    • R. Kodama and T. Mochizuki, Opt. Lett. 12, 990 (1987) and references therein.
    • R. Kodama and T. Mochizuki, Opt. Lett. 12, 990 (1987) and references therein.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.