Organic and inorganic hybrid-polymer thin films by PECVD method and characterization of their electrical and optical properties

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Bae, In Seob ^a   Cho, Sang Jin ^a   Jeong, Seong Hun ^a   Cho, Hyung Jun ^a   Hong, Byungyou ^a   Boo, Jin Hyo ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Chemical vapor deposition; Hybrid polymers; Silicon; Substrates; Thin films

Indexed keywords

ANNEALING TEMPERATURES; AS-GROWN; C-V CURVE; CARRIER GAS; DIELECTRIC CONSTANTS; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL PROPERTY MEASUREMENT; HYBRID POLYMERS; IMPEDANCE ANALYZER; INORGANIC HYBRIDS; INORGANIC PRECURSOR; METHYLCYCLOHEXANE; ORGANIC-INORGANIC HYBRID POLYMER; POLYMER THIN FILMS; RADIO FREQUENCIES; RF-POWER; SILICON SUBSTRATES; SINGLE-MOLECULAR PRECURSOR; TETRAETHYL ORTHOSILICATES;

ARGON; CROSSLINKING; DEPOSITION; ELECTRIC PROPERTIES; HYDROGEN; MECHANICAL PROPERTIES; OPTICAL PROPERTIES; ORGANIC POLYMERS; PLASMA DEPOSITION; PLASMAS; POLYMER BLENDS; POLYMER FILMS; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; VAPORS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 51249084657     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200731911     Document Type: Conference Paper

References (20)

1. W. W. Lee, P. S. Ho, MRS Bull. 1997, 22, 19.
2. M. Vogt, M. Kachel, K. Melzer, K. Drescher, Surf. Coat. Technol. 1998, 98, 948.
3. T. K. S. Wong, Y. H. The, J. L. Sudijono, A. See, Proc. SPIE 2000, 4227, 103.
4. S. Z. Yu, T. K. S. Wong, K. Pita, X. Hu, J. Vac. Sci. Technol. B 2002, 20(5), 2036.
5. Y. Xu, Y. Tsai, K. N. Tu, B. Zhao, Q.-Z. Liu, M. Brongo, G. T. T. Sheng, C. H. Tung, Appl. Phys. Lett. 1999, 75(6), 853.
6. K. Endo, T. Tatsumi, J. Appl. Phys. 1995, 78(2), 1370.
7. C. H. Ting, T. E. Seidel, Mater. Res. Soc. Symp. 1995, 381, 3.
8. M. J. Loboda, Microelectron. Eng. 2000, 50, 15.
9. L. M. Han, J. S. Pan, S. M. Chen, N. Balasubramanian, J. Shi, L. S. Wong, P. D. Foo, J. Electrochem. Soc. 2001, 148(7), F148.
10. Y. H. Kim, S. K. Lee, H. J. Kim, J. Vac. Sci. Technol. A: Vac. Surf. Films 2000, 18, 1216.
11. A. Grill, L. Perraud, V. Patel, C. Jahnes, C. Cohen, Mater. Res. Soc. Symp. Proc. 1999, 565, 107.
12. K. Endo, MRS Bull. 1997, 22, 55.
13. G. Socrates, "Infrared Characteristics Group Frequencies", Wiley, New York 1994, Chap. 18.
14. P. G. Pai, S. S. Chao, Y. Takagi, G. Lucovsky, J. Vac. Sci. Technol. A: Vac. Surf. Films 1986, 4(3), 689.
15. G. Lucovski, P. D. Richard, D. V. Tsu, S. Y. Lin, R. J. Markunas, J. Vac. Sci. Technol. A: Vac. Surf. Films 1986, 4(3), 681.
16. M. J. Loboda, C. M. Grove, R. F. Schneider, J. Electrochem. Soc. 1998, 145, 2861.
17. D. A. Neumayer, J. Appl. Phys. 2001, 90, 1801.
18. L. M. Han, J. S. Pan, S. M. Chen, N. Balasubramanian, J. Shi, L. S. Wong, P. D. Foo, J. Electrochem. Soc. 2001, 148(7), F148.
19. T. K. S. Wong, B. Liu, B. Narayanan, V. Ligatchev, R. Kumar, Thin Solid Films 2004, 462-463, 156.
20. T. M. Moore, C. D. Hartfield, J. M. Anthony, B. T. Ahlburn, P. S. Ho, R. Miller, "Characterization and Metrology for ULSI Technology: 2000", Gaithersburg, MD, Melville, NY 2000, 431.