Structure and mechanical properties of diamondlike carbon films produced by hollow-cathode plasma deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 5, 2008, Pages 1149-1153

  Jiang, H F ^a,b   Tian, X B ^a,b,c   Yang, S Q ^a,c   Fu, R K Y ^b   Chu, P K ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^c Shenzhen Key Laboratory of Composite Materials   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC LOAD MANAGEMENT; ELECTRON SOURCES; FRICTION; FUNCTIONAL GROUPS; GRAPHITE; HARDNESS; MECHANICAL PROPERTIES; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; PHOTOELECTRON SPECTROSCOPY; PLASMA DEPOSITION; STAINLESS STEEL; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

HOLLOW CATHODES; SAMPLE BIAS; SUBSTRATE BIASING;

CARBON FILMS;

EID: 50849129131     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2953711     Document Type: Article

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