Germanium nitride layers prepared by supersonic r.f. plasma jet

Surface and Coatings Technology

Volumn 78, Issue 1-3, 1996, Pages 280-283

  Soukup, L ^a   Perina V ^b   Jastrabik L ^a   Sicha M ^c   Pokorny P ^a   Soukup, R J ^d   Novak M ^a   Zemek, J ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

^c CHARLES UNIVERSITY   (Czech Republic)

^d UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

Germanium nitride; Supersonic plasma jet; Thin films

Indexed keywords

CHEMICAL BONDS; CHEMICAL REACTORS; GERMANIUM COMPOUNDS; GROWTH (MATERIALS); NITRIDES; PLASMA DEVICES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

GERMANIUM NITRIDE; PLASMA CHEMICAL REACTORS; STOICHIOMETRIC RATIO; SUPERSONIC RADIO FREQUENCY PLASMA JET;

MULTILAYERS;

EID: 0029734596     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02418-2     Document Type: Article

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