Effect of target self-bias voltage on the mechanical properties of diamond-like carbon films deposited by RF magnetron sputtering

Thin Solid Films

Volumn 468, Issue 1-2, 2004, Pages 149-154

  Chowdhury, S ^a   Laugier, M T ^a   Rahman, I Z ^a  

^a UNIVERSITY OF LIMERICK   (Ireland)

Author keywords

A15 Amorphous carbon; R403 Raman scattering; S444 Sputtering; X Nanoindentation; X Target self bias voltage

Indexed keywords

ELASTIC MODULI; HARDNESS; IMPURITIES; INDENTATION; MAGNETRON SPUTTERING; RAMAN SCATTERING; REMOVAL; VOLTAGE MEASUREMENT;

AMORPHOUS CARBON; NANOINDENTATION; RF MAGNETRON SPUTTERING; TARGET SELF-BIAS VOLTAGE;

DIAMOND LIKE CARBON FILMS;

EID: 4644273888     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.006     Document Type: Article

References (24)

1. Bhushan B. Diamond Relat. Mater. 8:1999;1985.
2. Chapman B. Glow Discharge Processes, Sputtering and Plasma Etching. 1980;John Wiley & Sons, New York.
3. Robertson J. Mater. Sci. Eng. R 37:2002;129.
4. Lucas B.N., Oliver W.C., Pharr G.M., Loubet J.-L. Mater. Res. Soc. Symp. Proc. 436:1997;233.
5. Oliver W.C., Pharr G.M. J. Mater. Res. 1992;1562.
6. Korsunsky A.M., McGurk M.R., Bull S.J., Page T.F. Surf. Coat. Technol. 99:1998;171.
7. Stoney G.G. Proc. R. Soc. Lond. A82:1909;172.
8. Hsu C.-Y., Hong F.C.-N. Diamond Relat. Mater. 8:1999;1315.
9. Prawer S., Nugent K.W., Lifshitz Y., Lempert G.D., Grossman E., Kulik J., Avigal I., Kalish R. Diamond Relat. Mater. 5:1996;433.
10. Zhang S., Zeng X.T., Xie H., Hing P. Surf. Coat. Technol. 123:2000;256.
11. Beeman D., Silverman J., Lynds R., Anderson M.R. Phys. Rev., B. 30:1984;870.
12. Richter A., Scheibe H.-J., Pompe W., Brezeinka K.-W., Muhling I. J. Non-Cryst. Solids. 88:1986;131.
13. Lu C.-J., Bogy D.B., Rosenblum S.S., Tessmer G.J. Thin Solid Film. 268:1995;83.
14. Kitajima M., Nakamura K. J. Nucl. Mater. 175:1990;251.
15. Kim Y.T., Cho S.M., Choi W.S., Hong B., Yoon D.H. Surf. Coat. Technol. 169-170:2003;291.
16. Uhlmann S., Frauenheim T. Phys. Rev. Lett. 81:1998;641.
17. Robertson J. Diamond Relat. Mater. 3:1994;361.
18. Davison A., Wilson A.D., Velar-Batista J.C.A., Leyland A., Matthews A., Fancey K.S. Thin Solid Films. 414:2002;7.
19. Jun Q., Jianbin L., Shizhu W., Jing W., Wenzh L. Surf. Coat. Technol. 128-129:2000;324.
20. Wu W.-J., Hon M.-H. Thin Solid Films. 307:1997;1.
21. Wu W.-J., Hon M.-H. Thin Solid Films. 345:1999;200.
22. Leyland A., Matthews A. Wear. 246:2000;1.
23. Oberle T.L. J. Met. 3:1951;438.
24. Halling J. Tribologia. 1:1982;15.