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Volumn 516, Issue 23, 2008, Pages 8569-8572
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The effect of oxygen incorporation in sputtered scandium nitride films
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Author keywords
Band gap; Doping; Oxygen; Scandium nitride; Sputtering; X ray diffraction
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Indexed keywords
CORUNDUM;
NITRIDES;
NONMETALS;
OXYGEN;
REACTIVE SPUTTERING;
SCANDIUM;
SPUTTER DEPOSITION;
THICK FILMS;
BAND GAP;
BASE PRESSURE;
DEPOSITION CHAMBERS;
DOPING;
EFFECT OF OXYGEN;
NITRIDE FILMS;
REACTIVE MAGNETRON SPUTTERING;
SAPPHIRE SUBSTRATES;
SCANDIUM NITRIDE;
SPUTTERING;
THIN FILMS;
X-RAY DIFFRACTION;
MAGNETRON SPUTTERING;
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EID: 50849085749
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2008.05.050 Document Type: Article |
Times cited : (75)
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References (31)
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