Cu planarization in electrochemical mechanical planarization

Journal of the Electrochemical Society

Volumn 153, Issue 6, 2006, Pages

  Liu, Feng Q ^a   Du, Tianbao ^a   Duboust, Alain ^a   Tsai, Stan ^a   Hsu, Wei Yung ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; REMOVAL; VOLTAGE CONTROL;

DOWNFORCE; ELECTROCHEMICAL MECHANICAL PLANARIZATION; PLANARIZATION EFFICIENCY;

ELECTROCHEMISTRY;

EID: 33646415362     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2186180     Document Type: Article

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