Optical properties of zinc nitride thin films fabricated by rf-sputtering from ZnN target

Thin Solid Films

Volumn 516, Issue 22, 2008, Pages 8170-8174

  Voulgaropoulou, P ^a   Dounis, S ^a   Kambilafka, V ^a   Androulidaki, M ^b   Ruzinsky M ^c   Saly V ^c   Prokein, P ^c   Viskadourakis, Z ^a,d   Tsagaraki, K ^b   Aperathitis, E ^b  

^a UNIVERSITY OF CRETE   (Greece)

^b INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^c SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^d UNIVERSITY OF CYPRUS   (Cyprus)

Author keywords

Annealing; Optical properties; Oxidation; Zinc nitride; Zinc oxide

Indexed keywords

NITRIDES; OPTICAL DESIGN; OPTICAL PROPERTIES; SEMICONDUCTING CADMIUM TELLURIDE; THICK FILMS; ZINC; ZINC COMPOUNDS;

ANNEALING; NITRIDE FILMS; NITRIDE THIN FILMS; OXIDATION; RF-MAGNETRON SPUTTERING; RF-SPUTTERING; ZINC NITRIDE; ZINC OXIDE;

MAGNETRON SPUTTERING;

EID: 50649096378     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.04.025     Document Type: Article

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