Boron nitride stamp for ultra-violet nanoimprinting lithography fabricated by focused ion beam lithography

Nanotechnology

Volumn 18, Issue 46, 2007, Pages

  Altun, Ali Ozhan ^a   Jeong, Jun Ho ^a   Rha, Jong Joo ^a   Kim, Ki Don ^a   Lee, Eung Sug ^a  

^a Korea Institute of Machine and Materials   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BORON NITRIDE; ION BEAM LITHOGRAPHY; MAGNETRON SPUTTERING; NANOIMPRINT LITHOGRAPHY; QUARTZ; ULTRAVIOLET RADIATION;

FOCUSED ION BEAM LITHOGRAPHY; HIGH UV TRANSMITTANCE; RF MAGNETRON SPUTTERING; ULTRA-VIOLET NANOIMPRINTING LITHOGRAPHY;

FOCUSED ION BEAMS;

BORON NITRIDE NANOTUBE; NANOFILM; RESIN; SILICON DIOXIDE; WATER;

ARTICLE; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; FOCUSED ION BEAM LITHOGRAPHY; HARDNESS; INFRARED SPECTROSCOPY; MICROWAVE OVEN; NANOANALYSIS; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPE; THICKNESS; ULTRAVIOLET NANOIMPRINT LITHOGRAPHY; ULTRAVIOLET RADIATION;

IONS; LITHOGRAPHY; QUARTZ;

EID: 36048996992     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/46/465302     Document Type: Article

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