Electrical characteristics of PtAu Schottky contacts to plasma-etched AlGaN

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 4, 2008, Pages 1420-1424

  Syed, A A ^a   Cao, X A ^a   Woodworth, A A ^a   Stinespring, C D ^a  

^a West Virginia University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL CHARACTERISTICS; INDUCTIVELY COUPLED PLASMAS; RECTIFYING CHARACTERISTICS; SCHOTTKY CONTACTS;

DISTILLATION; INDUCTIVELY COUPLED PLASMA; PHOTORESISTS; PLASMAS;

SURFACE TREATMENT;

EID: 49749129286     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2958254     Document Type: Article

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