Effects of plasma treatment on the Ohmic characteristics of Ti/AI/Ti/Au contacts to n-AIGaN

Applied Physics Letters

Volumn 89, Issue 8, 2006, Pages

  Cao, X A ^a,c   Piao, H ^a   LeBoeuf, S F ^a   Li, J ^b   Lin, J Y ^b   Jiang, H X ^b  

^a GE GLOBAL RESEARCH   (United States)

^b KANSAS STATE UNIVERSITY   (United States)

^c West Virginia University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT RESISTANCES; OHMIC CHARACTERISTICS; PLASMA TREATMENT; SURFACE CONDUCTIVITY;

ETCHING; PLASMA APPLICATIONS; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE TREATMENT;

EID: 33747843327     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2338434     Document Type: Article

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