Structure and mechanical properties of nitrogen-containing Zr-Cu based thin films deposited by pulsed magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 41, Issue 15, 2008, Pages

  Jimenez, O ^a   Audronis, M ^a   Baker, M A ^b   Matthews, A ^a   Leyland, A ^a  

^a UNIVERSITY OF SHEFFIELD   (United Kingdom)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; CLADDING (COATING); COATINGS; COPPER; COPPER ALLOYS; COPPER PLATING; HARDENING; IMAGING TECHNIQUES; MAGNETRONS; MECHANICAL PROPERTIES; NITRIDES; NITROGEN; NONMETALS; SPUTTER DEPOSITION; THICK FILMS; X RAY ANALYSIS; ZIRCONIUM;

ATOMIC RATIOS; CHEMICAL COMPOSITIONS; COATING HARDNESS; COATING STRUCTURES; COLUMNAR MORPHOLOGY; COPPER FILMS; CU BASED; DC MAGNETRON; ELECTRON MICROSCOPY.; ELEMENTAL COMPOSITIONS; ENERGY DISPERSIVE X-RAY ANALYSIS; NANO-INDENTATION MEASUREMENTS; NANO-STRUCTURED COATINGS; NITROGEN CONTENTS; PULSED MAGNETRON SPUTTERING; SOLUTION HARDENING; STRUCTURE AND MORPHOLOGY; THIN FILMS; X-RAY DIFFRACTION;

MAGNETRON SPUTTERING;

EID: 49749110779     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/15/155301     Document Type: Article

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