From uniform Cu thin films to 〈1 1 0〉 and 〈1 1 1〉 columns

Vacuum

Volumn 81, Issue 5, 2007, Pages 583-589

  Wei, H L ^a,d   Huang, Hanchen ^b,d   Woo, C H ^c,d   Zhangd, X X ^d  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^c HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^d HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

Columns; Magnetron sputtering; Texture

Indexed keywords

CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

COLUMNS; INTERNAL STRAIN; SPUTTERING POWER;

THIN FILMS;

EID: 33845229426     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.07.009     Document Type: Article

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