Copper thin film of alternating textures

Applied Physics Letters

Volumn 82, Issue 24, 2003, Pages 4265-4267

  Huang, Hanchen ^a   Wei, H L ^b,c   Woo, C H ^b   Zhang, X X ^d  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^c HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^d HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ATOMIC FORCE MICROSCOPY; COPPER; DEPOSITION; MAGNETRON SPUTTERING; MOLECULAR DYNAMICS; MORPHOLOGY; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; SILICA; TEXTURES; X RAY DIFFRACTION ANALYSIS;

ALTERNATING TEXTURES;

THIN FILMS;

EID: 0038110855     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1583866     Document Type: Article

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