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Volumn 52, Issue 3, 1999, Pages 269-275

Structure and microhardness of magnetron sputtered ZrCu and ZrCu-N films

Author keywords

Magnetron sputtering; Nanocomposite film ZrCu N; Nanocrystalline film; ZrCu

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLIZATION; MAGNETIC FILMS; MAGNETRON SPUTTERING; MICROHARDNESS; NANOSTRUCTURED MATERIALS; NITRIDES; NITROGEN; POLYCRYSTALLINE MATERIALS; PRESSURE EFFECTS; SPUTTER DEPOSITION; ZIRCONIUM ALLOYS;

EID: 0033096975     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00297-8     Document Type: Article
Times cited : (46)

References (10)
  • 8
    • 0032355111 scopus 로고    scopus 로고
    • Formation of nanocrystalline NiCr-N films prepared by reactive de magnetron sputtering
    • Nov/Dec in print
    • Musil J, Regent F. Formation of nanocrystalline NiCr-N films prepared by reactive de magnetron sputtering. J Vac Sci Technol A, Nov/Dec (1998), in print.
    • (1998) J Vac Sci Technol A
    • Musil, J.1    Regent, F.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.