The use of high glass temperature polymers in the production of transparent, structured surfaces using nanoimprint lithography

Microelectronic Engineering

Volumn 85, Issue 9, 2008, Pages 1897-1901

  Mills, Christopher A ^a   Fernandez, Javier G ^a   Errachid, Abdelhamid ^a   Samitier, Josep ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Embossing; Nanoimprint lithography; Polymer Engineering

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ESTERS; ETHYLENE; GLASS; MOLDS; NANOIMPRINT LITHOGRAPHY; NONMETALS; OPTICAL MICROSCOPY; PHOTORESISTS; POLYMERS; PROPYLENE; SILICON; SUPERCONDUCTING TRANSITION TEMPERATURE; THICKNESS MEASUREMENT;

BIO-MEDICAL APPLICATIONS; EMBOSSING; FLUORINATED ETHYLENE PROPYLENE COPOLYMER; GLASS TEMPERATURES; GLASS TRANSITION TEMPERATURE TG; GLASS TRANSITION TEMPERATURES; HOLE STRUCTURES; IMPRINT LITHOGRAPHY; NANO IMPRINTS; OPTICAL-; POLY-METHYL METHACRYLATE; POLYETHYLENE NAPHTHALATE; POLYMER ENGINEERING; SILICON-BASED; STRUCTURED SURFACES; SUB MICROMETERS; SUPERFICIAL STRUCTURES; SUPPORT LAYER; TALL STRUCTURES;

GLASS TRANSITION;

BIOTECHNOLOGY; COPOLYMERS; GLASS TRANSITION TEMPERATURE; LITHOGRAPHY; MICROSCOPY; POLYMERS; POLYMETHYL METHACRYLATE; SILICON;

EID: 49549091092     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.06.014     Document Type: Article

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