A Moiré method for high accuracy alignment in nanoimprint lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 925-927

  Muhlberger M ^a   Bergmair, I ^a,c   Schwinger, W ^a   Gmainer, M ^a   Schoftner R ^a   Glinsner, T ^b   Hasenfuss Ch ^c   Hingerl, K ^c   Vogler, M ^d   Schmidt, H ^e   Kley, E B ^e  

^a PROFACTOR GMBH   (Austria)

^b EV GROUP   (Austria)

^c INSTITUTE FOR MICROELECTRONICS   (Austria)

^d MICRO RESIST TECHNOLOGY GMBH   (Germany)

^e FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Alignment; Moir ; Nanoimprint lithography

Indexed keywords

NANOSTRUCTURES; PRECISION ENGINEERING; ULTRAVIOLET RADIATION;

ALIGNMENT ACCURACIES; MASS PRODUCTION; OPTICAL TECHNIQUES;

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY; PRECISION; ULTRAVIOLET RADIATION;

EID: 34247628469     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.081     Document Type: Article

References (11)

1. Lin S.Y., Fleming J.G., Hetherington D.L., Smith B.K., Biswas R., Ho K.M., Sigalas M.M., Zubrzycki W., Kurtz S.R., and Bur J. Nature 394 (1998) 251
2. Fleming J.G., Lin S.Y., El-Kady I., Biswas R., and Ho K.M. Nature 417 (2002) 52
3. Vargady L.O. Appl. Opt. 3 (1964) 631
4. King M.C., and Berry D.H. Appl. Opt. 11 11 (1972) 2455
5. Chou S.Y., and Krauss P.R. Microel. Eng. 35 (1997) 237
6. Wei Z., and Chou S.Y. Appl. Phys. Lett. 79 6 (2001) 845
7. Li N., Wu W., and Chou S.Y. Nanoletters 6 (2006) 2626
8. Molecular Imprints Press Release (November 2004).
9. A. Fuchs et al., in: A. Fuchs, B. Vratzov, T. Wahlbrink, Y. Georgiev, H. Kurz (Eds.), Proceedings NNT 2004, J. Vac. Sci. Technol. B 22 (6) (2004) 3242.
10. M. Mühlberger et al., in: 14th International Winterschool on New Developments in Solid State Physics, Mauterndorf, Austria, 13-17 February, 2006.
11. M. Mühlberger et al., in: Proceedings of the 6th International Conference of the European Society for Precision Engineering and Nanotechnology, vol. 1, Baden, Austria, 28 May-1 June, 2006, p. 309.