Characterization of α-Fe2O3 thin films deposited by atmospheric pressure CVD onto alumina substrates

Sensors and Actuators, B: Chemical

Volumn 34, Issue 1-3, 1996, Pages 412-416

  Chai, C C ^a   Peng, J ^a,b   Yan, B P ^a  

^a XIDIAN UNIVERSITY   (China)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

Atmospheric pressure CVD; Gas sensing properties; Fe2O3 thin films

Indexed keywords

EID: 0042045154     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(97)80014-7     Document Type: Article

References (8)

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