SCOPUS 정보 검색 플랫폼

Surface Science Spectra

Volumn 8, Issue 3, 2001, Pages 240-245

Chemical Vapor Deposited Fe2O3 Thin Films Analyzed by XPS

(5) Barreca, Davide a Battiston, Giovanni A b Berto, Davide b Gerbasi, Rosalba b Tondello, Eugenio c

a CNR Consiglio Nazionale delle Ricerche (Italy)

b CNR (Italy)

c UNIVERSITY OF PADOVA (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; HEMATITE; PHOTOELECTRONS; PHOTONS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOR DEPOSITED; CHEMICAL VAPOUR DEPOSITION; DECONVOLUTIONS; EXCITATION SOURCES; GLASSES IN; KΑ; OH-GROUPS; SURFACE DATA; THIN-FILMS; X-RAY PHOTOELECTRONS;

THIN FILMS;

EID: 34249279406 PISSN: 10555269 EISSN: 15208575 Source Type: Journal
DOI: 10.1116/11.20020302 Document Type: Article

Times cited : (20)

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