Substrate temperature dependent morphology and resistivity of pulsed laser deposited iridium oxide thin films

Thin Solid Films

Volumn 496, Issue 2, 2006, Pages 371-375

  Zhang, L M ^a   Gong, Y S ^a   Wang, C B ^a   Shen, Q ^a   Xia, M X ^a  

^a WUHAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Iridium oxide; Pulsed laser deposition; Resistivity; Scanning electron microscopy

Indexed keywords

ELECTRIC CONDUCTIVITY; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINE NATURE; IRIDIUM OXIDE; RESISTIVITY; SUBSTRATE TEMPERATURE;

IRIDIUM COMPOUNDS;

EID: 28044460540     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.076     Document Type: Article

References (20)

1. M.L. Hitchman, and S. Ramanathan Anal. Chim. Acta 263 1992 53
2. C.U. Pinnow, I. Kasho, N. Nagel, T. Mikolajick, and C. Dehm J. Appl. Phys. 91 2002 1707
3. R.K. Kawar, P.S. Chigare, and P.S. Patil Appl. Surf. Sci. 206 2003 90
4. K.G. Kreider, M.J. Tarlov, and J.P. Cline Sens. Actuators, B, Chem. 28 1995 167
5. A.M. Serventi, M.A. ElKhakani, and R.G. Saint-Jacques J. Mater. Res. 16 2001 2336
6. T. Pauporté, D. Aberdam, J.-L. Hazemann, R. Faure, and R. Durand J. Electroanal. Chem. 465 1999 88
7. K. Yamanaka Jpn. J. Appl. Phys. 28 1989 632
8. K. Nishio, Y. Watanabe, and T. Tsuchiya Thin Solid Films 350 1999 96
9. B.R. Chalamala, Y. Wei, and R.H. Reuss Appl. Phys. Lett. 74 1999 1394
10. M.A. El Khakani, M. Chaker, and E. Gat Appl. Phys. Lett. 69 1996 2027
11. Y.X. Liu, H. Masumoto, and T. Goto Mater. Trans. 45 2004 900
12. Powder diffraction file, Joint Committee on Powder Diffraction Standard, North Dakoda State University, USA, 1982, Card 34-0122.
13. P.S. Patil, P.S. Chigare, S.B. Sadale, T. Seth, D.P. Amalnerkar, and R.K. Kawar Mater. Chem. Phys. 80 2003 667
14. A.K. Goel, G. Skorinko, and F.H. Pollak Phys. Rev., B 24 1981 7342
15. P.C. Liao, C.S. Chen, W.S. Ho, Y.S. Huang, and K.K. Tiong Thin Solid Films 301 1997 7
16. M.A. ElKhakani, and M. Chaker Thin Solid Films 335 1998 6
17. T. Ishikawa, Y. Abe, M. Kawamura, and K. Sasaki Jpn. J. Appl. Phys. 42 2003 213
18. W.D. Ryden, A.W. Lawson, and C.C. Sartain Phys. Rev., B 1 1970 1494
19. R.H. Horng, D.S. Wuu, L.H. Wu, and M.K. Lee Thin Solid Films 373 2000 231
20. P.C. Liao, Y.S. Huang, and K.K. Tiong J. Alloys Compd. 317-318 2001 98