Iron oxide thin films prepared by ion beam induced chemical vapor deposition: Structural characterization by infrared spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2244-2248

  Yubero, F ^a   Ocana M ^a   Justo, A ^a   Contreras, L ^b   Gonzalez Elipe A R ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b UNIVERSITY OF SEVILLE   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; INFRARED SPECTROSCOPY; ION BEAMS; ION BOMBARDMENT; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

HEMATITES; ION BEAM INDUCED CHEMICAL VAPOR DEPOSITION;

IRON OXIDES;

EID: 0034275294     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1286198     Document Type: Article

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