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Volumn , Issue , 2008, Pages 171-174

Statistical simulation of RTS amplitude distribution in realistic bulk MOSFETs subject to random discreet dopants

Author keywords

3 D simulation; MOSFET; Random dopants; Random telegraph signals; Trapping

Indexed keywords

CHARGE TRAPPING; MOSFET DEVICES; NONMETALS; SILICON; STATISTICAL METHODS; THREE DIMENSIONAL; THRESHOLD VOLTAGE;

EID: 49049095979     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ULIS.2008.4527166     Document Type: Conference Paper
Times cited : (3)

References (11)
  • 1
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    • Random dopant induced threshold voltage lowering and fluctuations in sub 50nm MOSFETs: 3D atomistic' simulation study
    • A. Asenov, "Random dopant induced threshold voltage lowering and fluctuations in sub 50nm MOSFETs: 3D "atomistic' simulation study",Nanotechnology 10 (1999) 153-158.
    • (1999) Nanotechnology , vol.10 , pp. 153-158
    • Asenov, A.1
  • 3
    • 37549006492 scopus 로고    scopus 로고
    • H. Kurata, K. Otsuga, A. Kotabe, S. Kajiyama, T. Osabe, Y. Sasago, S. Narumi, K. Tokami, S. Kamohara, and O. Tsuchiya, The impact of RTS on the scaling of multilevel flash memories, Proc. Symp. VLSI Circuits, 13.3, 2006, pp. 112-113.
    • H. Kurata, K. Otsuga, A. Kotabe, S. Kajiyama, T. Osabe, Y. Sasago, S. Narumi, K. Tokami, S. Kamohara, and O. Tsuchiya, "The impact of RTS on the scaling of multilevel flash memories", Proc. Symp. VLSI Circuits, vol. 13.3, 2006, pp. 112-113.
  • 5
  • 6
    • 3242699588 scopus 로고    scopus 로고
    • Random telegraph signal noise simulation of decanano MOSFETs subject to atomic scale structure variation
    • A. Lee, A. R. Brown, A. Asenov and S. Roy, "Random telegraph signal noise simulation of decanano MOSFETs subject to atomic scale structure variation",Superlattices and Microstructures 34 (2003) 293-300.
    • (2003) Superlattices and Microstructures , vol.34 , pp. 293-300
    • Lee, A.1    Brown, A.R.2    Asenov, A.3    Roy, S.4
  • 8
    • 0035307248 scopus 로고    scopus 로고
    • Quantum enhancement of the random dopant induced threshold voltage fluctuations in sub 100 nm MOSFETs: A 3-Density-gradient simulation study
    • A. Asenov, G. Slavcheva, A. R. Brown, J. H. Davies, and S. Saini, "Quantum enhancement of the random dopant induced threshold voltage fluctuations in sub 100 nm MOSFETs: A 3-Density-gradient simulation study," IEEE Trans. Electron Devices, vol. 48, pp. 722-729, 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , pp. 722-729
    • Asenov, A.1    Slavcheva, G.2    Brown, A.R.3    Davies, J.H.4    Saini, S.5
  • 9
    • 0001055578 scopus 로고    scopus 로고
    • Random telegraph signal: An atomic probe of the local current in field-effect transistors
    • H. H. Mueller and M. Schulz, "Random telegraph signal: An atomic probe of the local current in field-effect transistors," J. Appl. Phys., vol. 83, pp. 1734-1741, 1998.
    • (1998) J. Appl. Phys , vol.83 , pp. 1734-1741
    • Mueller, H.H.1    Schulz, M.2
  • 11
    • 49049092273 scopus 로고    scopus 로고
    • Simulation of Intrinsic Parameter Fluctuations in Nano-CMOS Devices
    • PhD thesis, University of Glasgow, Electronics and Electrical Eng. Dept
    • Gareth D. Roy, "Simulation of Intrinsic Parameter Fluctuations in Nano-CMOS Devices". PhD thesis, University of Glasgow, Electronics and Electrical Eng. Dept., 2005.
    • (2005)
    • Roy, G.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.