Templating and replication of spiral photonic crystals for silicon photonics

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 14, Issue 4, 2008, Pages 1064-1073

  Seet, Kock Khuen ^a   Mizeikis, Vygantas ^a   Kannari, Kenta ^a   Juodkazis, Saulius ^a   Misawa, Hiroaki ^a   Tétreault, Nicolas ^b   John, Sajeev ^c  

^a HOKKAIDO UNIVERSITY   (Japan)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c UNIVERSITY OF TORONTO   (Canada)

Author keywords

Femtosecond laser lithography; Photonic band gap materials; Silicon

Indexed keywords

ABSORPTION; CRYSTAL ATOMIC STRUCTURE; CRYSTALLOGRAPHY; CRYSTALS; LITHOGRAPHY; MULTIPHOTON PROCESSES; NONMETALS; OPTICAL DESIGN; PHOTONIC DEVICES; PHOTONICS; PHOTORESISTS; POWDERS; PULSED LASER APPLICATIONS; SILICON; SILICON ON INSULATOR TECHNOLOGY;

COMMERCIAL PHOTORESIST; FEMTO-SECOND LASER; FEMTOSECOND LASER LITHOGRAPHY; MULTIPLE-BEAM INTERFERENCE; PHOTONIC BAND GAP MATERIALS; PHOTONIC CRYSTAL TEMPLATES; PHOTONIC STOP GAPS; SILICON PHOTONICS; SILICON-BASED; SPIRAL ARCHITECTURE; TEMPLATING; TWO-PHOTON ABSORPTION;

PHOTONIC CRYSTALS;

EID: 48949088460     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2008.922909     Document Type: Article

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