Formation of barrier-type amorphous anodic films on Ti-Mo alloys

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 151-154

  Habazaki, H ^a   Uozumi, M ^a   Konno, H ^a   Nagata, S ^b   Shimizu, K ^c  

^a HOKKAIDO UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c KEIO UNIVERSITY   (Japan)

Author keywords

Amorphous oxide; Anodizing; Capacitance; TEM; Ti Mo alloy

Indexed keywords

ANODES; ELECTROLYTES; MOLYBDENUM; SPUTTER DEPOSITION; TITANIUM ALLOYS;

AMORPHOUS ANODIC FILMS;

AMORPHOUS FILMS;

BARRIER; COATING; CORROSION RESISTANCE; FILM THICKNESS; SURFACE TREATMENT; TITANIUM ALLOY;

EID: 0038130866     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00216-0     Document Type: Article

References (11)

1. Aladjem A. J. Mater. Sci. 8 1973 688
2. Climent F. Capellades R. Mater. Lett. 18 1994 263
3. Shibata T. Zhu Y.-C. Corros. Sci. 37 1995 253
4. Habazaki H. Shimizu K. Nagata S. Skeldon P. Thompson G.E. Wood G.C. Corros. Sci. 44 2002 1047
5. Habazaki H. Takahiro K. Yamaguchi S.et al. Phil. Mag. A 78 1998 171
6. Furneaux R.C. Thompson G.E. Wood G.C. Corros. Sci. 18 1978 853
7. Doolittle L.R. Nucl. Instr. Meth. B 9 1985 344
8. Khalil N. Leach J.S.L. Electrochem. Acta 31 1986 1279
9. Habazaki H. Shimizu K. Nagata S. Skeldon P. Thompson G.E. Wood G.C. J. Electrochem. Soc. 149 2002 B70
10. Crossland A.C. Thompson G.E. Wan J.et al. J. Electrochem. Soc. 144 1997 847
11. Habazaki H. Shimizu K. Skeldon P. Thompson G.E. Wood G.C. Proc. R. Soc. Lond. A 453 1997 1593