A parametric study of laser induced ablation-oxidation on porous silicon surfaces

Journal of Physics Condensed Matter

Volumn 20, Issue 26, 2008, Pages

  De Stefano, Luca ^a   Rea, Ilaria ^a,b   Arcangela Nigro, M ^a   Della Corte, Francesco G ^a   Rendina, Ivo ^a  

^a CNR   (Italy)

^b UNIVERSITY OF NAPLES FEDERICO II   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; CHEMICAL OXYGEN DEMAND; DEPOSITS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; INFRARED SPECTROSCOPY; LASERS; NONMETALS; OXIDATION; POROSITY; PULSED LASER DEPOSITION; SILICON; SPECTROSCOPIC ANALYSIS; SPECTROSCOPIC ELLIPSOMETRY;

BLUE LIGHT LASERS; FOURIER TRANSFORM INFRARED (FT-IR); LASER FLUENCE; LASER-INDUCED ABLATION; LOW POWERS; NON DESTRUCTIVE; OPTICAL TECHNIQUES; OXIDATION PROCESSES; PARAMETRIC STUDIES; POROUS SAMPLES; POROUS SILICON LAYERS (PSL); POROUS SILICON SURFACES; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY (VASE);

POROUS SILICON;

EID: 48249096765     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/20/26/265009     Document Type: Article

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