Direct sub-μm lateral patterning of SOI by focused laser beam induced oxidation

Microelectronic Engineering

Volumn 48, Issue 1, 1999, Pages 367-370

  Deutschmann, R A ^a   Huber, M ^a   Neumann, R ^a   Brunner, K ^a   Abstreiter, G ^a  

^a WALTER SCHOTTKY INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTINUOUS WAVE LASERS; GAS LASERS; LASER BEAM EFFECTS; OXIDATION; SILICON ON INSULATOR TECHNOLOGY;

DIELECTRIC ISOLATION; LASER BEAM INDUCED OXIDATION; LATERAL PATTERNING;

GATES (TRANSISTOR);

EID: 0033190205     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00407-4     Document Type: Article

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