Formation of PbTe nanofilms by electrochemical atomic layer deposition (ALD)

Electrochimica Acta

Volumn 53, Issue 23, 2008, Pages 6988-6994

  Banga, Dhego O ^a   Vaidyanathan, Raman ^a   Xuehai, Liang ^a   Stickney, John L ^a   Cox, Stephen ^a   Happeck, Uwe ^a  

^a UNIVERSITY OF GEORGIA   (United States)

Author keywords

ALD; PbTe; Quantum confinement; UPD

Indexed keywords

ATOMIC PHYSICS; ATOMS; DEPOSITS; GOLD; LEAD; LEAD DEPOSITS; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION;

ATOMIC LAYER DEPOSITION (ATL); ATOMIC LAYERS; AU (111) SUBSTRATES; DEVICE STRUCTURES; LEAD TELLURIDE; NANO-FILMS;

ATOMIC LAYER DEPOSITION;

EID: 47249114878     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2008.02.108     Document Type: Article

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