Surface chemistry of InP(100) after wet and electrochemical etching: Is digital etching possible?

Journal of the Electrochemical Society

Volumn 153, Issue 1, 2006, Pages

  Muthuvel, Madhivanan ^a,b   Stickney, John ^a,b  

^a UNIVERSITY OF GEORGIA   (United States)

^b ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIGITAL ETCHING; ELECTROCHEMICAL ETCHING; HYDROGEN EVOLUTION;

ELECTROCHEMISTRY; ETCHING; HAFNIUM; OXIDATION; PH EFFECTS; SURFACE CHEMISTRY;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 33645525554     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2135208     Document Type: Article

References (36)

1. J. L. Stickney, in Advances in Electrochemical Science and Engineering, Vol. 7, D. M. Kolb, and, R. Alkire, Editors, p. 1, Wiley-VCH, Weinheim (2002).
2. R. K. Pandey, S. N. Sahu, and S. Chandra, Handbook of Semiconductor Electrodeposition, p. 289, Marcel Dekker, Inc., New York (1996).
3. F. Oba, F. Ernst, Y. S. Yu, R. Liu, M. Kothari, and J. A. Switzer, J. Am. Ceram. Soc., 88, 253 (2005).
4. R. Henriquez, H. Gomez, G. Riveros, J. F. Guillemoles, M. Froment, and D. Lincot, Electrochem. Solid-State Lett., 7, C75 (2004).
5. B. W. Gregory and J. L. Stickney, J. Electroanal. Chem., 300, 543 (1991).
6. S. K. Das, Thin Solid Films, 226, 259 (1993).
7. M. Nedelcu, M. Sima, T. Stoica, A. S. Manea, M. F. Lazarescu, and T. Visan, J. Optoelectron. Adv. Mater., 3, 909 (2001).
8. L. C. Ward, M. Muthuvel, and J. L. Stickney, in State-of-the-Art Program on Compound Semiconductors XXXIX -and- Nitride and Wide Bandgap Semiconductors for Sensors, Photonics, and Electronics IV, R. F. Kopf, A. G. Baca, S. J. Pearton, and F. Ren, Editors, PV 2003-11, p. 152, The Electrochemical Society Proceedings Series, Pennington, NJ (2003).
9. L. Beaunier, H. Cachet, R. Cortes, and M. Froment, J. Electroanal. Chem., 532, 215 (2002).
10. L. Beaunier, H. Cachet, R. Cortes, and M. Froment, Electrochem. Commun., 2, 508 (2000).
11. L. Beaunier, H. Cachet, R. Cortes, M. Froment, and A. Etcheberry, Thin Solid Films, 387, 108 (2001).
12. H. Cachet, R. Cortes, M. Froment, and G. Maurin, J. Solid State Electrochem., 1, 100 (1997).
13. A. Etcheberry, H. Cachet, R. Cortes, and M. Froment, Surf. Sci., 482, 954 (2001).
14. M. Froment, M. C. Bernard, R. Cortes, B. Mokili, and D. Lincot, J. Electrochem. Soc., 142, 2642 (1995).
15. G. Riveros, J. F. Guillemoles, D. Lincot, H. G. Meier, M. Froment, M. C. Bernard, and R. Cortes, Adv. Mater. (Weinheim, Ger.), 14, 1286 (2002).
16. D. Kikuchi, Y. Matsui, and S. Adachi, J. Electrochem. Soc., 147, 1973 (2000).
17. D. Kikuchi and S. Adachi, Mater. Sci. Eng., B, 76, 133 (2000).
18. H. C. Liu, S. H. Tsai, J. W. Hsu, and H. C. Shih, J. Electrochem. Soc., 146, 3510 (1999).
19. M. Tamura, K. C. Shin, N. Serizawa, and S. Arai, Jpn. J. Appl. Phys., Part 1, 35, 2383 (1996).
20. I. E. Vermeir, H. H. Goossens, F. Vandenkerchove, and W. P. Gomes, J. Electrochem. Soc., 139, 1389 (1992).
21. M. Sturzenegger, N. Prokopuk, C. N. Kenyon, W. J. Royea, and N. S. Lewis, J. Phys. Chem. B, 103, 10838 (1999).
22. I. E. Vermeir and W. P. Gomes, J. Electroanal. Chem., 365, 59 (1994).
23. T. Kikawa, I. Ochiai, and S. Takatani, Surf. Sci., 316, 238 (1994).
24. Q. Guo, M. E. Pemble, and E. M. Williams, Surf. Sci., 468, 92 (2000).
25. W. H. Hung, J. T. Hsieh, H. L. Hwang, H. Y. Hwang, and C. C. Chang, Surf. Sci., 418, 46 (1998).
26. E. J. Petit, F. Houzay, and J. M. Moison, Surf. Sci., 270, 902 (1992).
27. T. A. Sorenson, B. K. Wilmer, and J. L. Stickney, in Solid-Liquid Electrochemical Interfaces, Vol. 656, G. Jerkiewicz, K. Uosaki, and A. Wieckowski, Editors, p. 115, American Chemical Society, Washington, DC (1997).
28. Q. P. Lei and J. L. Stickney, Mater. Res. Soc. Symp. Proc. 237, 335 1992).
29. M. P. Soriaga and J. L. Stickney, in Modern Techniques in Electroanalytical Chemistry, Vol. 139, P. Vanysek, Editor, p. 1, John Wiley & Sons, Inc., New York (1996).
30. S. J. Pearton, F. Ren, C. R. Abernathy, W. S. Hobson, and H. S. Luftman, Appl. Phys. Lett., 58, 1416 (1991).
31. L. Zazzera and J. F. Evans, J. Vac. Sci. Technol. A, 11, 934 (1993).
32. M. M. Sung, S. H. Lee, S. M. Lee, D. Marton, S. S. Perry, and J. W. Rabalais, Surf. Sci., 382, 147 (1997).
33. J. B. Malherbe, Crit. Rev. Solid State Mater. Sci., 19, 129 (1994).
34. S. J. Hoekje and G. B. Hoflund, Thin Solid Films, 197, 367 (1991).
35. C. B. Duke, Chem. Rev. (Washington, D.C.), 96, 1237 (1996).
36. A. Gagnaire, J. Joseph, A. Etcheberry, and J. Gautron, J. Electrochem. Soc., 132, 1655 (1985).