Formation of thin films of CdTe, CdSe, and CdS by electrochemical atomic layer epitaxy

Journal of the Electrochemical Society

Volumn 145, Issue 5, 1998, Pages 1442-1449

  Colletti, Lisa P ^a,b   Flowers Jr , Billy H ^a   Stickney, John L ^a,b  

^a UNIVERSITY OF GEORGIA   (United States)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; ELECTRODEPOSITION; ELECTROLYTIC CELLS; EPITAXIAL GROWTH; FILM GROWTH; MICROANALYSIS; PARTICLES (PARTICULATE MATTER); SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING CADMIUM COMPOUNDS; STOICHIOMETRY; SURFACE ROUGHNESS; X RAY CRYSTALLOGRAPHY;

CADMIUM SELENIDE; CADMIUM SULFIDE; CADMIUM TELLURIDE; ELECTROCHEMICAL ATOMIC LAYER EPITAXY (ECALE); ELECTRON PROBE MICROANALYSIS (EPMA); GRAZING INCIDENT X RAY DIFFRACTION ANALYSIS;

SEMICONDUCTING FILMS;

EID: 0032072897     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838502     Document Type: Article

References (47)

1. Z. Loizos, A. Mitsis, N. Spyrellis, M. Froment, and G. Maurin, Thin Solid Films, 235, 51 (1993).
2. R. B. Gore, R. K. Pandey, and S. K. Kulkarni, J. Appl. Phys., 65, 2693 (1989).
3. J. Ortega, An. Quim., 87, 641 (1991).
4. G. F. Fulop and R. M. Taylor, Annu. Rev. Mater. Sci., 15, 197 (1985).
5. G. Hodes, in Physical Electrochemistry: Principles, Methods, and Applications, I. Rubinstein, Editor, pp. 515-554, M. Dekker, New York (1995).
6. R. K. Pandey, S. N. Sahu, and S. Chandra, Handbook of Semiconductor Electrodeposition, Marcel Dekker, Inc., New York (1996).
7. K. Rajeshwar, Adv. Mater., 4, 23 (1992).
8. B. W. Gregory and J. L. Stickney, J. Electroanal. Chem., 300, 543 (1991).
9. R. C. DeMattei and R. S. Feigelson, in Electrochemistry of Semiconductors and Electronics, Processes and Devices, J. McHardy and F. Ludwig, Editors, p. 1, Noyes Publications, Park Ridge, NJ (1992).
10. E. A. Dalchiele and S. Bonilla, J. Braz. Chem. Soc., 3, 95 (1992).
11. G. C. Morris and R. J. V. d. Veen, Sol. Energy Mater. Sol. Cells, 30, 339 (1993).
12. J. Dutta, D. Bhattacharyya, A. B. Maitil, S. Chaudhuri, and A. K. Pal, Vacuum, 46, 17 (1995).
13. G. Hodes, J. Manassen, and D. Cahen, Nature (London), 261, 403 (1976).
14. M. P. R. Panicker, M. Knaster, and F. A. Kroger, J. Electrochem. Soc., 125, 566 (1978).
15. J. M. Fisher, L. E. A. Berlouis, B. N. Rospendowski, P. J. Hall, and M. G. Astles, Semicond. Sci. Technol., 8, 1459 (1993).
16. C. Wei, N. Myung, and K. Rajeshwar, J. Electroanal. Chem., 347, 223 (1993).
17. S. M. So, W. Hwang, P. V. Meyers, and C. H. Liu, J. Appl. Phys., 61, 2234 (1987).
18. Y. Guo and X. Deng, Sol. Energy Mater. Sol. Cells, 29, 115 (1993).
19. T. Suntula and J. Anson, U.S. Pat. 4,058,430 (1977).
20. C. H. L. Goodman and M. V. Pessa, J. Appl. Phys., 60, R65 (1986).
21. Atomic Layer Growth and Processing, T. F. Kuech, P. D. Dapkus, and Y. Aoyagi, Editors, PV 222, Materials Research Society, Pittsburgh, PA (1991).
22. Atomic Layer Epitaxy, S. Bedair, Editor, Elsevier, Amsterdam (1993).
23. B. W. Gregory, M. L. Norton, and J. L. Stickney, J. Electroanal. Chem., 293, 85 (1990).
24. D. M. Kolb, in Advances in Electrochemistry and Electrochemical Engineering, Vol. 11, H. Gerischer and C. W. Tobias, Editors, p. 125, Wiley, New York (1978).
25. R. R. Adzic, in Advances in Electrochemistry and Electrochemical Engineering, Vol. 13, H. Gerischer and C. W. Tobias, Editors, p. 159, Wiley-Interscience, New York (1984).
26. K. Juttner and W. J. Lorenz, Z. Phys. Chem. N. F., 122, 163 (1980).
27. A. A. Gewirth and B. K. Niece, Chem. Rev., 97, 1129 (1997).
28. B. M. Huang, L. P. Colletti, B. W. Gregory, J. L. Anderson, and J. L. Stickney, J. Electrochem. Soc., 142, 3007 (1995).
29. L. P. Colletti and J. L. Stickney, In preparation.
30. L. P. Colletti, D. Teklay, and J. L. Stickney, J. Electroanal. Chem., 369, 145 (1994).
31. L. P. Colletti, S. Thomas, E. M. Wilmer, and J. L. Stickney, in Electrochemical Synthesis and Modification of Materials, MRS Symp. Proc., Vol. 451, P. C. Searson, T. P. Moffat, P. C. Andricacos, S. G. Corcoran, and J. L. Delplancke, Editors, p. 235, MRS, Pittsburgh, PA (1996).
32. J. W. Schultze, F. D. Koppitz, and M. M. Lohrengel, Ber. Bunsen-Ges. Phys. Chem., 78, 693 (1974).
33. F. M. Romeo, R. I. Tucceri, and D. Posadas, Surf. Sci., 203, 186 (1988).
34. M. R. Deakin and O. Melroy, J. Electroanal. Chem., 239, 321 (1988).
35. J. C. Bondos, A. A. Gewirth, and R. G. Nuzzo, J. Phys. Chem., 100, 8617 (1996).
36. A. N. Buckley, I. C. Hamilton, and R. Woods, J. Electroanal. Chem., 216, 213 (1987).
37. I. C. Hamilton and R. Woods, J. Appl. Electrochem., 13, 783 (1983).
38. G. Maurin and D. Pottier, J. Mater. Sci. Lett., 6, 817 (1987).
39. M. D. Vazquez and P. S. Batanero, Electrochim. Acta, 37, 1165 (1992).
40. C. Wei, N. Myung, and K. Rajeshwar, J. Electroanal. Chem., 375, 109 (1994).
41. G. S. R. Rao and J. J. Reddy, Acta Chim. Hung., 118, 241 (1985).
42. N. N. Greenwood and A. Earnshaw, Chemistry of the Elements, Pergamon Press, Oxford (1984).
43. T. E. Lister and J. L. Stickney, Appl. Surf. Sci., 107, 153 (1996).
44. T. E. Lister and J. L. Stickney, Isr. J. Chem., In press (1997).
45. Y. Golan, L. Margulis, I. Rubinstein, and G. Hodes, Langmuir, 8, 749 (1992).
46. G. Hodes, Isr. J. Chem., 3, 95 (1993).
47. Y. Golan, L. Margulis, G. Hodes, I. Rubinstein, and J. L. Hutchison, Surf. Sci., 311, L633 (1994).