-
4
-
-
0004084405
-
-
Marcel Dekker, Inc., New York
-
R. K. Pandey, S. N. Sahu, and S. Chandra, Handbook of Semiconductor Electrodeposition, Vol. 5, Marcel Dekker, Inc., New York (1996).
-
(1996)
Handbook of Semiconductor Electrodeposition
, vol.5
-
-
Pandey, R.K.1
Sahu, S.N.2
Chandra, S.3
-
5
-
-
0000618368
-
-
H. Gobrecht, H. D. Liess, and A. Tausend, Ber. Bunsen-Ges. Phys. Chem., 67, 930 (1963).
-
(1963)
Ber. Bunsen-Ges. Phys. Chem.
, vol.67
, pp. 930
-
-
Gobrecht, H.1
Liess, H.D.2
Tausend, A.3
-
6
-
-
30244451496
-
-
G. Hodes, J. Manassen, and D. Cahen, Nature, 261, 403 (1976).
-
(1976)
Nature
, vol.261
, pp. 403
-
-
Hodes, G.1
Manassen, J.2
Cahen, D.3
-
7
-
-
0017960614
-
-
M. P. R. Panicker, M. Knaster, and F. A. Kroger, J. Electrochem. Soc., 125, 566 (1978).
-
(1978)
J. Electrochem. Soc.
, vol.125
, pp. 566
-
-
Panicker, M.P.R.1
Knaster, M.2
Kroger, F.A.3
-
9
-
-
0027668184
-
-
Y. K. Gao, A. Z. Han, Y. Q. Lin, Y. C. Zhao, and J. D. Zhang, Thin Solid Films, 232, 278 (1993).
-
(1993)
Thin Solid Films
, vol.232
, pp. 278
-
-
Gao, Y.K.1
Han, A.Z.2
Lin, Y.Q.3
Zhao, Y.C.4
Zhang, J.D.5
-
10
-
-
0000812610
-
-
Y. Gao, A. Han, Y. Lin, Y. Zhao, and J. Zhang, J. Appl. Phys., 75, 549 (1994).
-
(1994)
J. Appl. Phys.
, vol.75
, pp. 549
-
-
Gao, Y.1
Han, A.2
Lin, Y.3
Zhao, Y.4
Zhang, J.5
-
11
-
-
0000511754
-
-
K. S. Murali, V. Subramanian, N. Rangarajan, A. S. Lakshmanan, and S. K. Rangarajan, J. Mater. Sci.: Mater. Electron., 2, 149 (1991).
-
(1991)
J. Mater. Sci.: Mater. Electron.
, vol.2
, pp. 149
-
-
Murali, K.S.1
Subramanian, V.2
Rangarajan, N.3
Lakshmanan, A.S.4
Rangarajan, S.K.5
-
16
-
-
0001736884
-
-
G. Mengoli, M. M. Musiani, and F. Paolucci, J. Electroanal. Chem., 332, 199 (1992).
-
(1992)
J. Electroanal. Chem.
, vol.332
, pp. 199
-
-
Mengoli, G.1
Musiani, M.M.2
Paolucci, F.3
-
17
-
-
0001453431
-
-
S. Cattarin, M. Musiani, U. Casellato, G. Rossetto, G. Razzini, F. Decker, and B. Scrosati, J. Electrochem. Soc., 142, 1267 (1995).
-
(1995)
J. Electrochem. Soc.
, vol.142
, pp. 1267
-
-
Cattarin, S.1
Musiani, M.2
Casellato, U.3
Rossetto, G.4
Razzini, G.5
Decker, F.6
Scrosati, B.7
-
18
-
-
0026155148
-
-
B. W. Gregory, D. W. Suggs, and J. L. Stickney, J. Electrochem. Soc., 138, 1279 (1991).
-
(1991)
J. Electrochem. Soc.
, vol.138
, pp. 1279
-
-
Gregory, B.W.1
Suggs, D.W.2
Stickney, J.L.3
-
19
-
-
0029373184
-
-
B. M. Huang, L. P. Colletti, B. W. Gregory, J. L. Anderson, and J. L. Stickney, J. Electrochem. Soc., 142, 3007 (1995).
-
(1995)
J. Electrochem. Soc.
, vol.142
, pp. 3007
-
-
Huang, B.M.1
Colletti, L.P.2
Gregory, B.W.3
Anderson, J.L.4
Stickney, J.L.5
-
20
-
-
0032072897
-
-
L. P. Colletti, B. H. Flowers, Jr., and J. L. Stickney, J. Electrochem. Soc., 145, 1442 (1998).
-
(1998)
J. Electrochem. Soc.
, vol.145
, pp. 1442
-
-
Colletti, L.P.1
Flowers Jr., B.H.2
Stickney, J.L.3
-
23
-
-
0001417712
-
-
G. D. Aloisi, M. Cavallini, M. Innocenti, M. L. Foresti, G. Pezzatini, and R. Guidelli, J. Phys. Chem., 101, 4774 (1997).
-
(1997)
J. Phys. Chem.
, vol.101
, pp. 4774
-
-
Aloisi, G.D.1
Cavallini, M.2
Innocenti, M.3
Foresti, M.L.4
Pezzatini, G.5
Guidelli, R.6
-
26
-
-
6644220584
-
-
Materials Research Society, Pittsburgh, PA
-
Atomic Layer Growth and Processing, T. F. Kuech, P. D. Dapkus, and Y. Aoyagi, Editors, Vol. 222, p. 360, Materials Research Society, Pittsburgh, PA (1991).
-
(1991)
Atomic Layer Growth and Processing
, vol.222
, pp. 360
-
-
Kuech, T.F.1
Dapkus, P.D.2
Aoyagi, Y.3
-
27
-
-
0004263014
-
-
S. Bedair, Editor, Elsevier, Amsterdam
-
S. Bedair, in Atomic Layer Epitaxy, S. Bedair, Editor, p. 304, Elsevier, Amsterdam (1993).
-
(1993)
Atomic Layer Epitaxy
, pp. 304
-
-
Bedair, S.1
-
28
-
-
0001193064
-
-
D. M. Kolb, Editor, John Wiley, New York
-
D. M. Kolb, in Physical and Electrochemcial Properties of Metal Monolayers on Metallic Substrates, Vol. 11, D. M. Kolb, Editor, p. 125, John Wiley, New York (1978).
-
(1978)
Physical and Electrochemcial Properties of Metal Monolayers on Metallic Substrates
, vol.11
, pp. 125
-
-
Kolb, D.M.1
-
29
-
-
0000600477
-
-
H. Gerishcher and C. W. Tobias, Editors, Wiley-Interscience, New York
-
R. R Adzic, in Advances in Electrochemistry and Electrochemical Engineering, Vol. 13, H. Gerishcher and C. W. Tobias, Editors, p. 159, Wiley-Interscience, New York (1984).
-
(1984)
Advances in Electrochemistry and Electrochemical Engineering
, vol.13
, pp. 159
-
-
Adzic, R.R.1
-
31
-
-
0037997768
-
-
card numbers 15-869, 5-642, 4-784, JCPDS International Center for Diffraction Data, Swarthmore, PA
-
Powder Diffraction File, Inorganic Phases, W. F. McClune, Editor, card numbers 15-869, 5-642, 4-784, JCPDS International Center for Diffraction Data, Swarthmore, PA (1992).
-
(1992)
Powder Diffraction File, Inorganic Phases
-
-
McClune, W.F.1
-
33
-
-
0003624373
-
-
Springer Verlag, New York
-
K. Seeger, in Semiconductor Physics, p. 40, Springer Verlag, New York (1982).
-
(1982)
Semiconductor Physics
, pp. 40
-
-
Seeger, K.1
-
34
-
-
0001107092
-
-
O. Alvarez-Fregoso, J. G. Mendoza-Alvarez, and O. Zelaya-Angle, J. Appl. Phys., 82, 708 (1997).
-
(1997)
J. Appl. Phys.
, vol.82
, pp. 708
-
-
Alvarez-Fregoso, O.1
Mendoza-Alvarez, J.G.2
Zelaya-Angle, O.3
-
35
-
-
0001644667
-
-
L. Levy, D. Ingert, N. Feltin and M. P. Pileni, J. Cryst. Growth, 184/185, 377 (1998).
-
(1998)
J. Cryst. Growth
, vol.184-185
, pp. 377
-
-
Levy, L.1
Ingert, D.2
Feltin, N.3
Pileni, M.P.4
-
36
-
-
0343159124
-
-
T. van Buuren, L. N. Dinh, L. L. Chase, W. J. Siekhaus, and L. J. Terminello, Phys. Rev. Lett., 80, 3803 (1998).
-
(1998)
Phys. Rev. Lett.
, vol.80
, pp. 3803
-
-
Van Buuren, T.1
Dinh, L.N.2
Chase, L.L.3
Siekhaus, W.J.4
Terminello, L.J.5
|