Correlation between the dielectric constant and X-ray diffraction pattern of Si-O-C thin films with hydrogen bonds

Thin Solid Films

Volumn 468, Issue 1-2, 2004, Pages 316-321

  Oh, Teresa ^a   Oh, Kyoung Suk ^a   Lee, Kwang Man ^a   Choi, Chi Kyu ^a  

^a Jeju National University   (South Korea)

Author keywords

Cross link breakdown; Radial distribution functions; Si O C thin film; X ray diffraction pattern

Indexed keywords

CROSSLINKING; DIELECTRIC MATERIALS; ELECTRON ENERGY LOSS SPECTROSCOPY; FOURIER TRANSFORMS; HYDROGEN BONDS; PERMITTIVITY; POROUS SILICON; SEMICONDUCTING SILICON COMPOUNDS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION;

CROSS-LINK BREAKDOWN; RADIAL DISTRIBUTION FUNCTIONS; SI-O-C THIN FILMS; X RAY DIFFRACTION PATTERNS;

THIN FILMS;

EID: 4644296077     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.089     Document Type: Article

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