Industry divides on low-k dielectric

Semiconductor International

Volumn 24, Issue 5, 2001, Pages 66-76

  Peters, Laura ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; COPPER; CROSSTALK; DIELECTRIC DEVICES; ELECTRIC CONNECTORS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE;

COPPER INTERCONNECTS;

DIELECTRIC FILMS;

EID: 0035336330     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (2)

1. L. Peters, "Low-k Dielectrics Get Respectable," Semiconductor International, April 2001, p. 15.
2. L. Peters, "Pursuing the Perfect Low-k Dielectric," Semiconductor International, September 1998, p. 64.