Effects of pre-aging and concentration of surface modifying agent on the microstructure and dielectric properties of SiO2 xerogel film

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 467-472

  Kim, Jung Ho ^a   Jung, Sang Bae ^a   Park, Hyung Ho ^a   Hyun, Sang Hoon ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AGING OF MATERIALS; DRYING; GELS; MICROSTRUCTURE; PERMITTIVITY; POROUS MATERIALS; PRESSURE EFFECTS; SILICA; SURFACE TREATMENT;

XEROGELS;

DIELECTRIC FILMS;

EID: 16744363778     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01370-5     Document Type: Article

References (15)

1. Case C.B., Kornblit A., Lau K.S.Y., Hendricks N.H. Proc. ISMIC Conf. 104:1995;116.
2. Smith D.M., Anderson J., Cho C.C., Johnston G.P., Jeng S.P. Proc. Mater. Res. Symp. 381:1995;261.
3. Prakash S.S., Brinker C.J., Hurd A.J., Rao S.M. Nature. 374:1995;439.
4. Scherer G.W. J. Non-Cryst. Solids. 100:1988;77.
5. Iler R.K. The Chemistry of Silica. 1979;Wiley, New York.
6. Davis P.J., Brinker C.J., Smith D.M. J. Non-Cryst. Solids. 142:1992;189.
7. Haereid S., Anderson J., Einarsrud M.A., Hua D.W., Smith D.M. J. Non-Cryst. Solids. 185:1995;221.
8. Prakash S.S., Brinker C.J., Hurd A.J. J. Non-Cryst. Solids. 190:1995;264.
9. Mackens U., Merkt U. Thin Solid Films. 97:1982;53.
10. Brinker C.J., Scherer G.W. Sol-gel Science. 1990;581 Academic Press, San Diego.
11. Hong J.K., Yang H.S., Jo M.H., Park H.H., Choi S.Y. Thin Solid Films. 308:1997;495.
12. Henning S., Svensson L. Phys. Scripta. 23:1981;697.
13. Jo M.H., Park H.H., Kim D.J., Hyun S.H., Choi S.Y., Paik J.T. J. Appl. Phys. 82:1997;1299.
14. Cho H.I., Jo W., Noh T.W. Appl. Phys. Lett. 65:1994;1525.
15. Jo M.H., Park H.H. Appl. Phys. Lett. 72:1998;1391.